Fabrication of single-crystal few-layer graphene domains on copper by modified low-pressure chemical vapor deposition

CrystEngComm ◽  
2014 ◽  
Vol 16 (32) ◽  
pp. 7558-7563 ◽  
Author(s):  
Y. G. Shi ◽  
D. Wang ◽  
J. C. Zhang ◽  
P. Zhang ◽  
X. F. Shi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Growth Mechanism ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Layer Graphene ◽  
Pressure Chemical ◽  
Few Layer Graphene

Few-layer graphene domains are fabricated by modified LPCVD on Cu and the growth mechanism is schematically shown in the figure.

Chemical vapor deposition growth of few-layer graphene for transparent conductive films

RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44142-44148 ◽  
Author(s):  
Jun Pu ◽  
Lei Tang ◽  
Chaowei Li ◽  
Taotao Li ◽  
Lin Ling ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Conductive Films ◽  
Layer Graphene ◽  
Pressure Chemical ◽  
Few Layer Graphene ◽  
Etching Effect

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).

Cu hill and graphene grain evolution in the synthesis of millimeter-sized single crystal graphene during low pressure chemical vapor deposition

RSC Advances ◽  
2014 ◽  
Vol 4 (62) ◽  
pp. 32941-32945 ◽  
Author(s):  
Shuya Zhu ◽  
Quanfu Li ◽  
Qian Chen ◽  
Weihua Liu ◽  
Xin Li ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

The evolution of Cu hills beneath graphene grains during the growth of millimeter scale single crystal graphene using low pressure chemical vapor deposition (LPCVD) was investigated.

scholarly journals Piezo-Hall effect in single crystal p-type 3C–SiC(100) thin film grown by low pressure chemical vapor deposition

RSC Advances ◽  
2016 ◽  
Vol 6 (37) ◽  
pp. 31191-31195 ◽  
Author(s):  
Afzaal Qamar ◽  
H.-P. Phan ◽  
Toan Dinh ◽  
Li Wang ◽  
Sima Dimitrijev ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Hall Effect ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
First Results ◽  
Pressure Chemical ◽  
P Type

This article reports the first results on piezo-Hall effect in single crystal p-type 3C–SiC(100) Hall devices.

AB stacked few layer graphene growth by chemical vapor deposition on single crystal Rh(1 1 1) and electronic structure characterization

2016 ◽  
Vol 369 ◽  
pp. 251-256 ◽  
Author(s):  
Apostolis Kordatos ◽  
Nikolaos Kelaidis ◽  
Sigiava Aminalragia Giamini ◽  
Jose Marquez-Velasco ◽  
Evangelia Xenogiannopoulou ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Structure Characterization ◽  
Graphene Growth ◽  
Layer Graphene ◽  
Few Layer Graphene

Millimeter-Size Single-Crystal Graphene by Suppressing Evaporative Loss of Cu During Low Pressure Chemical Vapor Deposition

2013 ◽  
Vol 25 (14) ◽  
pp. 2062-2065 ◽  
Author(s):  
Shanshan Chen ◽  
Hengxing Ji ◽  
Harry Chou ◽  
Qiongyu Li ◽  
Hongyang Li ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Evaporative Loss

Role of limited hydrogen and flow interval on the growth of single crystal to continuous graphene by low-pressure chemical vapor deposition

2017 ◽  
Vol 28 (7) ◽  
pp. 075602 ◽  
Author(s):  
Munu Borah ◽  
Abhishek K Pathak ◽  
Dilip K Singh ◽  
Prabir Pal ◽  
Sanjay R Dhakate
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Tribological Performance of Steel With Multi-Layer Graphene Grown by Low-Pressure Chemical Vapor Deposition

2020 ◽  
Vol 142 (12) ◽  
Author(s):  
Sudesh Singh ◽  
Xinchun Chen ◽  
Chenhui Zhang ◽  
Rakesh Kumar Gautam ◽  
Rajnesh Tyagi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Friction Coefficient ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Tribological Performance ◽  
Gcr15 Steel ◽  
Layer Graphene ◽  
Metal Metal ◽  
Pressure Chemical

Abstract To explore the potential of directly grown multi-layer graphene as an agent in reducing friction and wear of steel on steel tribo-pair, multi-layer graphene films were synthesized on GCr15 steel in a low-pressure chemical vapor deposition (LPCVD) setup using a gaseous mixture of acetylene and hydrogen onto a bearing steel substrate. An interlayer of electroplated nickel was deposited on steel to assist and accelerate the graphene deposition. The tribological performance was evaluated using a ball-on-disc tribometer with an average Hertzian pressure of 0.2, 0.28, 0.34, and 0.42 GPa over a stroke length of 5 mm against GCr15 steel ball and compared with bare steel and nickel-plated steel. The results indicate that the friction coefficient is dependent on the applied load and decrease with increasing load, and the minimum friction coefficient of ∼0.13 was obtained for an applied normal load of 1 N; however, the coating failed after 250 cycles. The decrease in friction coefficient has been attributed to the homogenization of the deposited multi-layer graphene along the sliding direction and transfer of graphene to counter-face ball leading to inhibition of metal-metal contact. The investigation suggests that this kind of coating has the potential of improving the tribological performance of metal-metal tribo-pairs.

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