ZnO nanoparticle-decorated HfO2/Sn-doped In2O3core–shell nanowires by atomic layer deposition: enhancement of field emission behavior by surface modification engineering

2014 ◽  
Vol 2 (27) ◽  
pp. 5335-5341 ◽  
Author(s):  
Wen-Chih Chang ◽  
Chi-Hsin Huang ◽  
Chih-Chung Lai ◽  
Hsu-Sheng Tsai ◽  
Shih-Min Lin ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Field Emission ◽  
Atomic Layer ◽  
Zno Nanoparticle ◽  
Layer Deposition ◽  
Emission Behavior ◽  
Shell Nanowires

One-Dimensional TiO2@GaON Core-Shell Nanowires with Controlled Shell Thickness from Atomic Layer Deposition for Stable and Efficient Photoelectrochemical Water Splitting

2019 ◽  
Author(s):  
Jiajia Tao ◽  
Hong-Ping Ma ◽  
Kaiping Yuan ◽  
Yang Gu ◽  
Jianwei Lian ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Band Gap ◽  
Water Splitting ◽  
Atomic Layer ◽  
Photoelectrochemical Water Splitting ◽  
Core Shell ◽  
Photoelectrochemical Performance ◽  
Highly Efficient ◽  
Layer Deposition ◽  
Shell Nanowires

<div>As a promising oxygen evolution reaction semiconductor, TiO2 has been extensively investigated for solar photoelectrochemical water splitting. Here, a highly efficient and stable strategy for rationally preparing GaON cocatalysts on TiO2 by atomic layer deposition is demonstrated, which we show significantly enhances the</div><div>photoelectrochemical performance compared to TiO2-based photoanodes. For TiO2@20 nm-GaON core-shell nanowires a photocurrent density up to 1.10 mA cm-2 (1.23 V vs RHE) under AM 1.5 G irradiation (100 mW cm-2) has been achieved, which is 14 times higher than that of TiO2 NWs. Furthermore, the oxygen vacancy formation on GaON as well as the band gap matching with TiO2 not only provides more active sites for water oxidation but also enhances light absorption to promote interfacial charge separation and migration. Density functional theory studies of model systems of GaON-modified TiO2 confirm the band gap reduction, high reducibility and ability to activate water. The highly efficient and stable systems of TiO2@GaON core-shell nanowires provide a deeper understanding and universal strategy for enhancing photoelectrochemical performance of photoanodes now available. </div>

Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

2011 ◽  
Vol 11 (8) ◽  
pp. 7322-7326 ◽  
Author(s):  
Hyun Ae Lee ◽  
Young-Chul Byun ◽  
Umesh Singh ◽  
Hyoung J. Cho ◽  
Hyoungsub Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Film ◽  
Layer Deposition

Atomic layer deposition-triggered hierarchical core/shell stable bifunctional electrocatalysts for overall water splitting

2021 ◽  
Vol 9 (37) ◽  
pp. 21132-21141
Author(s):  
T. Kavinkumar ◽  
Selvaraj Seenivasan ◽  
Hyeonjung Jung ◽  
Jeong Woo Han ◽  
Do-Heyoung Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Water Splitting ◽  
Atomic Layer ◽  
Core Shell ◽  
Interface Engineering ◽  
Bifunctional Electrocatalyst ◽  
Overall Water Splitting ◽  
Bifunctional Electrocatalysts ◽  
Layer Deposition

A synergistic strategy of interface engineering and surface modification is efficient to construct a promising bifunctional electrocatalyst for enhanced electrocatalytic water splitting.

Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition

2019 ◽  
Vol 23 (11) ◽  
pp. 2362-2368 ◽  
Author(s):  
Cosima Hirschberg ◽  
Nikolaj Sølvkær Jensen ◽  
Johan Boetker ◽  
Anders Østergaard Madsen ◽  
Tommi O. Kääriäinen ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Powder Characteristics

scholarly journals Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition ◽  
Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

Surface modification and fabrication of 3D nanostructures by atomic layer deposition

MRS Bulletin ◽  
2011 ◽  
Vol 36 (11) ◽  
pp. 887-897 ◽  
Author(s):  
Changdeuck Bae ◽  
Hyunjung Shin ◽  
Kornelius Nielsch
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
3D Nanostructures ◽  
Layer Deposition ◽  
Image Position

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