A facile low-temperature growth of large-scale uniform two-end-open Ge nanotubes with hierarchical branches

2013 ◽  
Vol 1 (35) ◽  
pp. 5471 ◽  
Author(s):  
Xiangdong Li ◽  
Guowen Meng ◽  
An-Ping Li ◽  
Zhaoqin Chu ◽  
Xiaoguang Zhu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Large Scale ◽  
Temperature Growth ◽  
Low Temperature Growth

Low-temperature growth and characterization of epitaxial ZnO nanorods by metalorganic chemical vapor deposition

2007 ◽  
Vol 22 (7) ◽  
pp. 2032-2036 ◽  
Author(s):  
Dong Chan Kim ◽  
Bo Hyun Kong ◽  
Sung-Yun Jeon ◽  
Ji-Beom Yoo ◽  
Hyung Koun Cho ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Large Scale ◽  
Metalorganic Chemical Vapor Deposition ◽  
Zno Nanorods ◽  
Chemical Vapor ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Metalorganic Chemical

By injecting additional argon gas, we were able to grow one-dimensional ZnO nanorod arrays with a uniform distribution on a large scale at a low temperature of less than 330 °C by metalorganic chemical vapor deposition. All of the nanorods grown on the sapphire substrate had a 30° in-plane rotation with respect to the substrate and showed the epitaxial characteristics of [10¯10]ZnO//[11¯20]sapphire, despite the low-temperature growth. These ZnO nanorods with high crystalline quality exhibited a high enhancement factor and low turn-on field value, thus having good potential to be used as a field emitter.

Low-temperature growth of large-scale, single-crystalline graphene on Ir(111)

2019 ◽  
Vol 28 (5) ◽  
pp. 056107 ◽  
Author(s):  
Hui Guo ◽  
Hui Chen ◽  
Yande Que ◽  
Qi Zheng ◽  
Yu-Yang Zhang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Large Scale ◽  
Temperature Growth ◽  
Single Crystalline ◽  
Low Temperature Growth

Low Temperature Growth of Silicon Dioxide Thin Films by UV Photo-oxidation

2002 ◽  
Vol 751 ◽  
Author(s):  
Atsuyuki Fukano ◽  
Hiroyuki Oyanagi
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Silicon Dioxide ◽  
Large Scale ◽  
Average Density ◽  
Vlsi Circuits ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Photo Oxidation ◽  
Silicon Technology

AbstractThe low-temperature growth of thin SiO2 layers for gate insulators in very large-scale integrated (VLSI) circuits is becoming an urgent topic of silicon technology. In contrast, to conventional thermal oxidization processes (T>900°C), ultraviolet (UV) photo-oxidation of silicon technology is a promising approach for low-temperature growth of silicon dioxide thin films. We have grown silicon dioxide thin films at low temperature (T<500 °C) using an excimer lamp with various wavelengths and evaluated the quality of thin SiO2 layers as well as the SiO2–Si interface. We found that the SiO2 layers (t<5 nm) grown by UV photo-oxidation show significant differences in physical properties, such as density profile, from those of thermal oxidization, i.e., the higher average density 2.23 g/cm3 and more constant distribution, making the SiO2–Si interface region, so-called “transition layer” less eminent. Superior characteristics of ultra-thin SiO2 layer grown by UV photo-oxidation are demonstrated.

A novel low-temperature growth of uniform CuInS2 thin films and their application in selenization/sulfurization-free CuInS2 solar cells

2021 ◽  
Vol 26 ◽  
pp. 102050
Author(s):  
Mehdi Dehghani ◽  
Ershad Parvazian ◽  
Nastaran Alamgir Tehrani ◽  
Nima Taghavinia ◽  
Mahmoud Samadpour
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Low Temperature ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Cuins2 Thin Films

scholarly journals Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition

ACS Omega ◽  
2021 ◽  
Author(s):  
Muhammad Aniq Shazni Mohammad Haniff ◽  
Nur Hamizah Zainal Ariffin ◽  
Poh Choon Ooi ◽  
Mohd Farhanulhakim Mohd Razip Wee ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Bilayer Graphene ◽  
Cold Wall ◽  
Polycrystalline Nickel ◽  
Large Area ◽  
Temperature Growth ◽  
Low Temperature Growth

Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation

2021 ◽  
Vol 3 (3) ◽  
pp. 1244-1251
Author(s):  
Hyunjin Joh ◽  
Gopinathan Anoop ◽  
Won-June Lee ◽  
Dipjyoti Das ◽  
Jun Young Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Ultraviolet Light ◽  
Light Irradiation ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Ultraviolet Light Irradiation ◽  
Deep Ultraviolet

The influence of preinfection cold hardening and disease development period on the interaction between barley yellow dwarf virus and cold stress tolerance in wheat

1983 ◽  
Vol 61 (7) ◽  
pp. 1935-1940 ◽  
Author(s):  
C. J. Andrews ◽  
Y. C. Paliwal
Keyword(s):  
Low Temperature ◽  
Barley Yellow Dwarf Virus ◽  
Yellow Dwarf ◽  
Dwarf Virus ◽  
Dry Matter Content ◽  
Disease Development ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Barley Yellow Dwarf ◽  
Yellow Dwarf Virus

Cold hardness and ice encasement tolerance of 'Fredrick' and 'Norstar' winter wheats as affected by infection with barley yellow dwarf virus (BYDV) were determined during inoculation, disease development periods, and low-temperature growth. Plants were either prehardened to cold, or warm grown before infection; two disease development periods (DDP) were utilized. A long DDP induced greater pathogenesis and greater hardiness reduction than a short DDP. The effect of virus infection on the final level of hardiness of prehardened plants was generally greater than on that of nonprehardened plants. Viral infection reduced hardiness up to 3.5 °C in 'Fredrick' wheat, but reductions of 6–10 °C below hardiness potential were recorded after certain environmental regimes allowing disease development. Ice tolerance was reduced by BYDV infection in early low-temperature growth but was increased by infection after 4 months at low temperature. This increase in survival was associated with higher dry matter content in infected than in noninfected plants.

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