Self-assembly of PBzMA-b-PDMAEMA diblock copolymer films at the air–water interface and deposition on solid substrates via Langmuir–Blodgett transfer

Soft Matter ◽  
2013 ◽  
Vol 9 (45) ◽  
pp. 10899 ◽  
Author(s):  
P. Cecilia dos Santos Claro ◽  
Marcos E. Coustet ◽  
Carolina Diaz ◽  
Eliana Maza ◽  
M. Susana Cortizo ◽  
...  
Keyword(s):  
Diblock Copolymer ◽  
Self Assembly ◽  
Water Interface ◽  
Langmuir Blodgett ◽  
Copolymer Films ◽  
Solid Substrates ◽  
Air Water Interface

Capillary Wave Studies of Polystyrene-b-poly(methacrylic acid) Diblock Copolymer Films at the Air−Water Interface

Langmuir ◽  
1997 ◽  
Vol 13 (6) ◽  
pp. 1592-1601 ◽  
Author(s):  
J. V. Gandhi ◽  
J. V. Maher ◽  
K. A. Shaffer ◽  
T. M. Chapman
Keyword(s):  
Methacrylic Acid ◽  
Diblock Copolymer ◽  
Capillary Wave ◽  
Water Interface ◽  
Copolymer Films ◽  
Air Water Interface

Nanosheet Films of Schiff Bases Polymer for Micropatterning

2014 ◽  
Vol 488-489 ◽  
pp. 260-264
Author(s):  
Qiu Ling Wang ◽  
Yong Na Li ◽  
Hui Ying Jia ◽  
Yong Ze Wei ◽  
Hui Fan Du ◽  
...  
Keyword(s):  
Free Radical ◽  
Film Formation ◽  
Wet Etching ◽  
Side Chain ◽  
Water Interface ◽  
Lb Films ◽  
Langmuir Blodgett ◽  
Solid Substrates ◽  
Air Water Interface ◽  
Deep Uv

A series of novel copolymers [p (AOBHA-co-NPMA)] containing 2-Allyloxy-N-benzylidene hexadecylamine (AOBHA) as film formation material and β-naphtayl methacrylate (NPMA) as photosensitive group were synthesized by free-radical polymerization. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 35 layers were fabricated by deep UV irradiation, followed by developing with acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV and GPC, in which showed that the scission of main and side chain of p (AOBHA-co-NPMA) LB films occurred at the same time.

Micropatterning of Schiff Bases Polymer Langmuir-Blodgett (LB) Films

2011 ◽  
Vol 239-242 ◽  
pp. 1998-2001
Author(s):  
Tie Sheng Li ◽  
Wen Jian Xu ◽  
Hui Ying Jia ◽  
Yang Jie Wu ◽  
Tokuji Miyashita
Keyword(s):  
Methyl Methacrylate ◽  
Schiff Bases ◽  
Uv Irradiation ◽  
Wet Etching ◽  
Water Interface ◽  
Lb Films ◽  
Langmuir Blodgett ◽  
Solid Substrates ◽  
Air Water Interface ◽  
Deep Uv

A series of novel copolymers poly (AOBDA-co-DNMMA)s containing 2-Allyloxy-N-benzyl- idene dodecylamine (AOBDA) and 1.4-dioxaspiro[4.4] nonane-2-methyl methacrylate (DNMMA) were synthesized. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates successively. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 40 layers were obtained by deep UV irradiation, followed by developing in acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV, IR and GPC.

Light‐Triggered, Non‐Centrosymmetric Self‐Assembly of Aqueous Arylazopyrazoles at the Air‐Water Interface and SHG Switching

2020 ◽  
Author(s):  
Nobuo Kimizuka ◽  
Yuki Nagai ◽  
Keita Ishiba ◽  
Ryosuke Yamamoto ◽  
Teppei Yamada ◽  
...  
Keyword(s):  
Self Assembly ◽  
Water Interface ◽  
Air Water Interface

Chlorophyll a–violaxanthin interactions in monolayers at air–water interface and in Langmuir–Blodgett films

2000 ◽  
Vol 19 (2) ◽  
pp. 117-125 ◽  
Author(s):  
Wieslaw I Gruszecki ◽  
Bogumil Zelent ◽  
Heidar-Ali Tajmir-Riahi ◽  
Gongming Wang ◽  
Toufik Taleb ◽  
...  
Keyword(s):  
Chlorophyll A ◽  
Water Interface ◽  
Langmuir Blodgett ◽  
Air Water Interface ◽  
Langmuir Blodgett Films
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