A facile fabrication process for polystyrene nanoring arrays

Nanoscale ◽  
2013 ◽  
Vol 5 (22) ◽  
pp. 11071 ◽  
Author(s):  
Zuzanna A. Lewicka ◽  
Arash Bahloul ◽  
William W. Yu ◽  
Vicki L. Colvin
Keyword(s):  
Fabrication Process ◽  
Facile Fabrication

Synthesis of monodisperse Ag–Au alloy nanoparticles with large size by a facile fabrication process

2011 ◽  
Vol 131 (1-2) ◽  
pp. 136-141 ◽  
Author(s):  
Weiwei Zhang ◽  
Liqing Huang ◽  
Jian Zhu ◽  
You Liu ◽  
Jun Wang
Keyword(s):  
Fabrication Process ◽  
Alloy Nanoparticles ◽  
Large Size ◽  
Facile Fabrication

Facile fabrication of centimeter-scale stripes with inverse-opal photonic crystals structure and analysis of formation mechanism

RSC Advances ◽  
2016 ◽  
Vol 6 (60) ◽  
pp. 54976-54983 ◽  
Author(s):  
Chen Ding ◽  
Jian-Chen Hu ◽  
Wei Yuan ◽  
De-Zhuang Du ◽  
Ya Yang ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Photonic Crystals ◽  
Formation Mechanism ◽  
Fabrication Process ◽  
Colloidal Nanoparticles ◽  
Polymer Microspheres ◽  
Inverse Opal ◽  
Self Assembling ◽  
Facile Fabrication

A facile fabrication process for centimeter-scale colloidal photonic crystal stripe is developed through self-assembling polymer microspheres and silica colloidal nanoparticles. With the aid of sintering, porous-ordered microstructure forms.

scholarly journals Nanostructured Hybrid-Material Transparent Surface with Antireflection Properties and a Facile Fabrication Process

ACS Omega ◽  
2019 ◽  
Vol 4 (22) ◽  
pp. 19840-19846
Author(s):  
Juan Rombaut ◽  
Manuel Fernandez ◽  
Prantik Mazumder ◽  
Valerio Pruneri
Keyword(s):  
Hybrid Material ◽  
Fabrication Process ◽  
Transparent Surface ◽  
Facile Fabrication

A GENERAL ANISOTROPIC ETCHING STRATEGY FOR THE FABRICATION OF TUBE-LIKE OR MESOPOROUS SINGLE CRYSTAL TiO2

2013 ◽  
Vol 06 (06) ◽  
pp. 1350051
Author(s):  
YUN WEI ◽  
HAO PAN ◽  
JIESHU QIAN ◽  
XINGFU ZHOU
Keyword(s):  
Single Crystal ◽  
Vital Role ◽  
Anisotropic Etching ◽  
Fabrication Process ◽  
Single Crystalline ◽  
Facile Fabrication

A general anisotropic etching strategy is proposed here for the synthesis of four types of novel TiO 2 materials with versatile tube-like and single-crystalline mesoporous micro-nanostructures. All the tube-like TiO 2 materials have V-shaped inner structure and the mesoporous products have high single-crystallinity. In the fabrication process, etching agents and titanium sources play vital role in determining the morphology of the TiO 2 products. This opens a door toward facile fabrication of tube-like or single-crystalline mesoporous nanomaterials via anisotropic etching route.

Linewidth measurement using the low voltage SEM

1986 ◽  
Vol 44 ◽  
pp. 652-653
Author(s):  
M.G. Rosenfield
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Secondary Electron ◽  
Low Voltage ◽  
Fabrication Process ◽  
Critical Dimensions ◽  
Linewidth Measurement ◽  
Threshold Technique ◽  
Scanning Electron

Minimum feature sizes in experimental integrated circuits are approaching 0.5 μm and below. During the fabrication process it is usually necessary to be able to non-destructively measure the critical dimensions in resist and after the various process steps. This can be accomplished using the low voltage SEM. Submicron linewidth measurement is typically done by manually measuring the SEM micrographs. Since it is desirable to make as many measurements as possible in the shortest period of time, it is important that this technique be automated.Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary electron signal generated by that structure. Thus, it is important to understand how the actual dimension of the line being measured relates to the secondary electron signal. Since different features generate different signals, the same method of relating linewidth to signal cannot be used. For example, the peak to peak method may be used to accurately measure the linewidth of an isolated resist line; but, a threshold technique may be required for an isolated space in resist.

Facile fabrication of ZrO 2 @PMMA@polysiloxane nanohybrids and their application for light diffusing films

2019 ◽  
Vol 14 (4) ◽  
pp. 349-352
Author(s):  
Xiaohai Bu ◽  
Dongxian Li ◽  
Zewu Zhang ◽  
Chaofeng Hong ◽  
Li Zhang ◽  
...  
Keyword(s):  
Facile Fabrication

INTEGRATED FABRICATION PROCESS FOR SOLID OXIDE FUELCELLS USING HYBRID PLASMA SPRAYING

1997 ◽  
Vol 1 (1) ◽  
pp. 41-47 ◽  
Author(s):  
Noriyuki Nomoto ◽  
Yoshitomi Okazaki ◽  
Kenji Kuroda ◽  
Shunji Takenoiri ◽  
Toyonobu Yoshida
Keyword(s):  
Plasma Spraying ◽  
Solid Oxide ◽  
Fabrication Process ◽  
Hybrid Plasma
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