The reaction of formaldehyde carbonyl oxide with the methyl peroxy radical and its relevance in the chemistry of the atmosphere

2013 ◽  
Vol 15 (43) ◽  
pp. 18921 ◽  
Author(s):  
Josep M. Anglada ◽  
Santiago Olivella ◽  
Albert Solé
Keyword(s):  
Peroxy Radical ◽  
Carbonyl Oxide

scholarly journals Computational study on the mechanism and kinetics for the reaction between HO2 and n-propyl peroxy radical

RSC Advances ◽  
2019 ◽  
Vol 9 (69) ◽  
pp. 40437-40444
Author(s):  
Zhenli Yang ◽  
Xiaoxiao Lin ◽  
Jiacheng Zhou ◽  
Mingfeng Hu ◽  
Yanbo Gai ◽  
...  
Keyword(s):  
Temperature Dependence ◽  
Temperature Regime ◽  
Computational Study ◽  
Peroxy Radical ◽  
Negative Temperature ◽  
Mechanism And Kinetics ◽  
Lower Temperature

The negative temperature dependence for the HO2 + n-C3H7O2 reaction in lower temperature regime.

Novel aspects of carbonyl oxide chemistry

1997 ◽  
Vol 10 (11) ◽  
pp. 787-796 ◽  
Author(s):  
Katsuya Ishiguro ◽  
Takayuki Nojima ◽  
Yasuhiko Sawaki
Keyword(s):  
Carbonyl Oxide

Formation of ozonides: a kinetic secondary isotope effect for the carbonyl oxide

1983 ◽  
Vol 105 (14) ◽  
pp. 4839-4841 ◽  
Author(s):  
Jong In Choe ◽  
Robert L. Kuczkowski
Keyword(s):  
Isotope Effect ◽  
Carbonyl Oxide

The Influence of Irradiation Temperature on U.V. Induced Defect Creation in Dry Silica

1985 ◽  
Vol 61 ◽  
Author(s):  
R. A. B. Devine ◽  
C. Fiori ◽  
J. Robertson
Keyword(s):  
Oxygen Vacancy ◽  
Peroxy Radical ◽  
Irradiation Temperature ◽  
Threshold Temperature ◽  
Peroxy Radicals ◽  
Oxygen Hole ◽  
Spin Resonance ◽  
Dependent Growth ◽  
Dose Dependent ◽  
Annealing Curve

ABSTRACTElectron spin resonance measurements have been carried out on samples of Suprasil Wl (dry silica) subjected to ultraviolet laser radiation (λ = 248 nm, E = 5 eV/photon). Studies have been made for fixed irradiation temperature (room) variable accumulated ultraviolet dose and fixed accumulated dose (3000 J/cm2) at various irradiation temperatures in the range 110 K to 335 K. Three principal defect centers are observed. Non-bridging oxygen hole centers are created at all temperatures in the range studied with slightly higher efficiency at room temperature (ration 300 K/150 K ∼ 2.5). Comparison of the dose dependent growth curve of the 4.8 eV absorption and its isochronal annealing curve with those for the oxygen hole center clearly identify the origin of the absorption band with this defect. A threshold temperature ∼ 200 K is found for oxygen vacancy creation consistent with results on single crystalline quartz. Post irradiation annealing at 593 K eliminates the vacancy centers and the peroxy radical resonance appears. Its growth as a function of accumulated ultraviolet dose and irradiation temperature supports the hypothesis that peroxy radicals form by the trapping of diffusing, molecular oxygen at the oxygen vacancy center.

Peroxy-Radical-Mediated Chemiluminescence: Mechanistic Diversity and Fundamentals for Antioxidant Assay

ChemInform ◽  
2007 ◽  
Vol 38 (9) ◽  
Author(s):  
Galina F. Fedorova ◽  
Alexey V. Trofimov ◽  
Rostislav F. Vasil'ev ◽  
Timur L. Veprintsev
Keyword(s):  
Peroxy Radical ◽  
Antioxidant Assay

Peroxy radical reactivities in the cooxidation of ethylbenzene and substituted 3-phenylindans

1981 ◽  
Vol 13 (2) ◽  
pp. 111-118 ◽  
Author(s):  
V. S. Rafikova ◽  
Z. K. Maizus ◽  
I. P. Skibida ◽  
R. N. Volkov
Keyword(s):  
Peroxy Radical
Sign in / Sign up

Export Citation Format

Share Document