scholarly journals A systematic study of atmospheric pressure chemical vapor deposition growth of large-area monolayer graphene

2012 ◽  
Vol 22 (4) ◽  
pp. 1498-1503 ◽  
Author(s):  
Lixin Liu ◽  
Hailong Zhou ◽  
Rui Cheng ◽  
Yu Chen ◽  
Yung-Chen Lin ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Systematic Study ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Monolayer Graphene ◽  
Large Area ◽  
Chemical Vapor Deposition Growth ◽  
Pressure Chemical

Chemical vapor deposition growth of few-layer graphene for transparent conductive films

RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44142-44148 ◽  
Author(s):  
Jun Pu ◽  
Lei Tang ◽  
Chaowei Li ◽  
Taotao Li ◽  
Lin Ling ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Conductive Films ◽  
Layer Graphene ◽  
Pressure Chemical ◽  
Few Layer Graphene ◽  
Etching Effect

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).

Synthesis of large-area uniform MoS 2 films by substrate-moving atmospheric pressure chemical vapor deposition: from monolayer to multilayer

2D Materials ◽  
2019 ◽  
Vol 6 (2) ◽  
pp. 025030 ◽  
Author(s):  
Tianying He ◽  
Yongjun Li ◽  
Zhifei Zhou ◽  
Cheng Zeng ◽  
Liang Qiao ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Large Area ◽  
Pressure Chemical

scholarly journals Large-area synthesis of monolayer MoSe2 films on SiO2/Si substrates by atmospheric pressure chemical vapor deposition

RSC Advances ◽  
2017 ◽  
Vol 7 (45) ◽  
pp. 27969-27973 ◽  
Author(s):  
Yu Zhao ◽  
Hyunjea Lee ◽  
Woong Choi ◽  
Weidong Fei ◽  
Cheol Jin Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Large Area ◽  
Si Substrates ◽  
Pressure Chemical

We report the synthesis of large-area monolayer MoSe2 films extended up to a millimeter scale on SiO2/Si substrates by atmospheric pressure chemical vapor deposition (CVD).

scholarly journals Atmospheric pressure chemical vapor deposition growth of vertically aligned SnS2 and SnSe2 nanosheets

RSC Advances ◽  
2021 ◽  
Vol 11 (58) ◽  
pp. 36483-36493
Author(s):  
Ayrton Sierra-Castillo ◽  
Emile Haye ◽  
Selene Acosta ◽  
Raul Arenal ◽  
Carla Bittencourt ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Cvd Method ◽  
Pressure Chemical ◽  
Vertically Aligned

SnS2 and SnSe2 nanosheets were synthesized vertically aligned in different substrates by an AP-CVD method.

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