Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

2010 ◽  
Vol 46 (31) ◽  
pp. 5634 ◽  
Author(s):  
Nicole Herzer ◽  
Stephanie Hoeppener ◽  
Ulrich S. Schubert
2015 ◽  
Vol 51 (11) ◽  
pp. 2060-2063 ◽  
Author(s):  
Austin W. H. Lee ◽  
Brandy K. Pilapil ◽  
Him Wai Ng ◽  
Byron D. Gates

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces.


1999 ◽  
Vol 14 (5) ◽  
pp. 2116-2123 ◽  
Author(s):  
Hyunjung Shin ◽  
Yuhu Wang ◽  
Uma Sampathkumaran ◽  
Mark R. De Guire ◽  
Arthur H. Heuer ◽  
...  

The pyrolysis of siloxy-anchored, organic self-assembled monolayers (SAMs) on oxide substrates [titanium dioxide powder; hydrolyzed silicon dioxide on (100) silicon] was studied using x-ray photoelectron spectroscopy (XPS), thermogravimetric analysis (TGA), and mass spectroscopy (MS). Pyrolysis in air began on heating at 200 °C and was complete by 400 °C for both octadecyltrichlorosilane (OTS) and C16-thioacetate (TA) SAMs, as observed in TGA of SAM-coated TiO2 powders, and in XPS studies of TA-SAM-coated TiO2 powders and Si wafers after various heat treatments. In low-oxygen environments, pyrolysis of SAMs began at higher temperatures: between 250 and 400 °C for heating in ultrahigh vacuum (10−8 Torr) as observed in XPS studies of TA-SAMs on Si, and between 300 and 400 °C in nitrogen, as observed in TEM analysis of sulfonate SAMs under a TiO2 thin film on Si substrates.


Langmuir ◽  
2022 ◽  
Author(s):  
Niklas B. Arndt ◽  
Friederike Schlüter ◽  
Marcus Böckmann ◽  
Thorsten Adolphs ◽  
Heinrich F. Arlinghaus ◽  
...  

2010 ◽  
Vol 7 (2) ◽  
pp. 227-231 ◽  
Author(s):  
Christian Belgardt ◽  
Harald Graaf ◽  
Thomas Baumgärtel ◽  
Christian von Borczyskowski

Langmuir ◽  
2010 ◽  
Vol 26 (6) ◽  
pp. 3878-3882 ◽  
Author(s):  
Daniel Kehrlösser ◽  
Jens Träger ◽  
Hee-Cheol Kim ◽  
Norbert Hampp

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