Size tuning of Au nanoparticles formed by electron beam irradiation of Au25 quantum clusters anchored within and outside of dipeptide nanotubes

2009 ◽  
Vol 19 (44) ◽  
pp. 8456 ◽  
Author(s):  
Perumal Ramasamy ◽  
Samit Guha ◽  
Edakkattuparambil Sidharth Shibu ◽  
Theruvakkattil S. Sreeprasad ◽  
Soumabha Bag ◽  
...  
Nanoscale ◽  
2018 ◽  
Vol 10 (17) ◽  
pp. 7978-7983 ◽  
Author(s):  
Liang Cheng ◽  
Xianfang Zhu ◽  
Jiangbin Su

The coalescence of two single-crystalline Au nanoparticles on surface of amorphous SiOxnanowire, as induced by electron beam irradiation, wasin situstudied at room temperature in a transmission electron microscope.


2011 ◽  
Vol 13 (33) ◽  
pp. 14823 ◽  
Author(s):  
Akihito Imanishi ◽  
Shinobu Gonsui ◽  
Tetsuya Tsuda ◽  
Susumu Kuwabata ◽  
Ken-ichi Fukui

Author(s):  
B. L. Armbruster ◽  
B. Kraus ◽  
M. Pan

One goal in electron microscopy of biological specimens is to improve the quality of data to equal the resolution capabilities of modem transmission electron microscopes. Radiation damage and beam- induced movement caused by charging of the sample, low image contrast at high resolution, and sensitivity to external vibration and drift in side entry specimen holders limit the effective resolution one can achieve. Several methods have been developed to address these limitations: cryomethods are widely employed to preserve and stabilize specimens against some of the adverse effects of the vacuum and electron beam irradiation, spot-scan imaging reduces charging and associated beam-induced movement, and energy-filtered imaging removes the “fog” caused by inelastic scattering of electrons which is particularly pronounced in thick specimens.Although most cryoholders can easily achieve a 3.4Å resolution specification, information perpendicular to the goniometer axis may be degraded due to vibration. Absolute drift after mechanical and thermal equilibration as well as drift after movement of a holder may cause loss of resolution in any direction.


Author(s):  
Wei-Chih Wang ◽  
Jian-Shing Luo

Abstract In this paper, we revealed p+/n-well and n+/p-well junction characteristic changes caused by electron beam (EB) irradiation. Most importantly, we found a device contact side junction characteristic is relatively sensitive to EB irradiation than its whole device characteristic; an order of magnitude excess current appears at low forward bias region after 1kV EB acceleration voltage irradiation (Vacc). Furthermore, these changes were well interpreted by our Monte Carlo simulation results, the Shockley-Read Hall (SRH) model and the Generation-Recombination (G-R) center trap theory. In addition, four essential examining items were suggested and proposed for EB irradiation damage origins investigation and evaluation. Finally, by taking advantage of the excess current phenomenon, a scanning electron microscope (SEM) passive voltage contrast (PVC) fault localization application at n-FET region was also demonstrated.


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