The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates

2007 ◽  
Vol 136 ◽  
pp. 329 ◽  
Author(s):  
Geoffrey Hyett ◽  
Christopher S. Blackman ◽  
Ivan P. Parkin
Keyword(s):  
Thin Films ◽  
Tungsten Oxide ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Crystal Morphology ◽  
Chemical Vapour ◽  
Glass Substrates ◽  
Pressure Chemical ◽  
Tungsten Oxide Thin Films ◽  
Effect Of Oxygen

Atmospheric pressure chemical vapour deposition of SnSe and SnSe2 thin films on glass

2008 ◽  
Vol 516 (15) ◽  
pp. 4750-4757 ◽  
Author(s):  
Nicolas D. Boscher ◽  
Claire J. Carmalt ◽  
Robert G. Palgrave ◽  
Ivan P. Parkin
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Pressure Chemical

Atmospheric pressure chemical vapour deposition of tin sulfide thin films

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-403-Pr8-410 ◽  
Author(s):  
I. P. Parkin ◽  
L. S. Price ◽  
A. M.E. Hardy ◽  
R. J.H. Clark ◽  
T. G. Hibbert ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Tin Sulfide ◽  
Pressure Chemical

Single-step synthesis of doped TiO2 stratified thin-films by atmospheric-pressure chemical vapour deposition

2014 ◽  
Vol 2 (19) ◽  
pp. 7082 ◽  
Author(s):  
Carlos Sotelo-Vazquez ◽  
Raul Quesada-Cabrera ◽  
Jawwad A. Darr ◽  
Ivan P. Parkin
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Step ◽  
Doped Tio2 ◽  
Pressure Chemical
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