Supercritical carbon dioxide-assisted oxidative degradation and removal of polymer residue after reactive ion etching of photoresist

2007 ◽  
Vol 9 (2) ◽  
pp. 133-138 ◽  
Author(s):  
Bertrand Lo ◽  
ChuChun Tai ◽  
JiaYaw Chang ◽  
ChienHui Wu ◽  
BoJung Chen ◽  
...  
2007 ◽  
Vol 36 (9) ◽  
pp. 1128-1129 ◽  
Author(s):  
Naohisa Yanagihara ◽  
Naoto Abe ◽  
Hironori Takama ◽  
Yuichiro Shimamura ◽  
Masaaki Yoshida

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