Templating the patterning of gold nanoparticles using a stained triblock copolymer film surfaceElectronic supplementary information (ESI) available: TEM image of a gold nanoparticle, showing lattice of gold atoms, with corresponding electron diffraction pattern. See http://www.rsc.org/suppdata/jm/b3/b308479p/

2003 ◽  
Vol 13 (10) ◽  
pp. 2412 ◽  
Author(s):  
Imtiyaz A. Ansari ◽  
Ian W. Hamley
Keyword(s):  
Gold Nanoparticles ◽  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Gold Nanoparticle ◽  
Electron Diffraction Pattern ◽  
Triblock Copolymer ◽  
Copolymer Film ◽  
Supplementary Information

The structure of amorphous and polycrystalline materials using energy-filtered RDF analysis

1992 ◽  
Vol 50 (2) ◽  
pp. 1190-1191
Author(s):  
David Cockayne ◽  
David McKenzie
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Density Function ◽  
Electron Diffraction Pattern ◽  
Polycrystalline Materials ◽  
Nearest Neighbour ◽  
X Ray ◽  
Selected Area Electron Diffraction ◽  
Reduced Density ◽  
System F

The technique of Electron Reduced Density Function (RDF) analysis has ben developed into a rapid analytical tool for the analysis of small volumes of amorphous or polycrystalline materials. The energy filtered electron diffraction pattern is collected to high scattering angles (currendy to s = 2 sinθ/λ = 6.5 Å-1) by scanning the selected area electron diffraction pattern across the entrance aperture to a GATAN parallel energy loss spectrometer. The diffraction pattern is then converted to a reduced density function, G(r), using mathematical procedures equivalent to those used in X-ray and neutron diffraction studies.Nearest neighbour distances accurate to 0.01 Å are obtained routinely, and bond distortions of molecules can be determined from the ratio of first to second nearest neighbour distances. The accuracy of coordination number determinations from polycrystalline monatomic materials (eg Pt) is high (5%). In amorphous systems (eg carbon, silicon) it is reasonable (10%), but in multi-element systems there are a number of problems to be overcome; to reduce the diffraction pattern to G(r), the approximation must be made that for all elements i,j in the system, fj(s) = Kji fi,(s) where Kji is independent of s.

Photographical Record of the Dispersion Surface in Rotating Crystal Electron Diffraction Pattern

1968 ◽  
Vol 23 (4) ◽  
pp. 544-549 ◽  
Author(s):  
G. Lehmpfuhl ◽  
A. Reissland
Keyword(s):  
Dynamical System ◽  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Electron Diffraction Pattern ◽  
Plane Waves ◽  
Zone Axis ◽  
System Of Equations ◽  
Wave Fields ◽  
Dispersion Surface ◽  
Crystal Electron

Strong interacting wave fields in a wedge-shaped crystal are separated into different plane waves when leaving the crystal and reveal points on the dispersion surface. By rotating the crystal while moving the film one obtains a photographical record of a section through the dispersion surface which may be compared with theory. An experiment with a macroscopic MgO wedge is reported. The 002 interference with excitation error nearly zero was recorded near the [I10] zone axis while rotating the crystal about the [001] axis. The diagrams are compared with dynamical 17-beam calculations. The results show that a reduction of the infinite dynamical system of equations to 17 equations is correct under these special geometrical conditions.

In-Situ Transmission Electron Microscopy Investigation of Aluminum Induced Crystallization of Amorphous Silicon

2008 ◽  
Vol 1066 ◽  
Author(s):  
Ram Kishore ◽  
Renu Sharma ◽  
Satoshi Hata ◽  
Noriyuki Kuwano ◽  
Yoshitsuga Tomokiyo ◽  
...  
Keyword(s):  
Electron Diffraction ◽  
Amorphous Silicon ◽  
Diffraction Pattern ◽  
Electron Diffraction Pattern ◽  
Polycrystalline Silicon ◽  
Nanocrystalline Silicon ◽  
Transmission Electron ◽  
In Situ Heating ◽  
Induced Crystallization

ABSTRACTThe interaction of amorphous silicon and aluminum films to achieve polycrystalline silicon has been investigated using transmission electron microscope equipped with in-situ heating holder. Carbon coated nickel grids were used for TEM studies. An ultra high vacuum cluster tool was used for the deposition of a ∼50nm a-Si films and a vacuum deposition system was used to deposit a ∼50nm Al films on a-Si film. The microstructural features and electron diffraction in the plain view mode were observed with increase in temperature starting from room temperature to 275 °C. The specimen was loaded inside TEM heating holder. The temperature was measured and kept constant for 5 minutes during which the microstructure at fixed magnification of X63K was recorded and the electron diffraction pattern of the same area was also recorded. The temperature was then increase and fixed at desired value and microstructure and EDP were again recorded. The temperatures used in this experiment were 30, 100, 150, 200, 225, 275°C. A sequential change in microstructural features and electron diffraction pattern due to interfacial diffusion of boundary between Al and amorphous Si was investigated. Evolution of polycrystalline silicon with randomly oriented grains as a result of a-Si and Al interaction was revealed. After the in-situ heating experiment the specimen was subjected to high resolution TEM and EDS investigations after removing the excess Al. The EDS analysis of the crystallized specimen was performed to locate the Al distribution in the crystallized silicon. These studies show that the Al induced crystallization process can be used to prepare polycrystalline as well as nanocrystalline silicon by controlling the in-situ annealing parameters. The investigations are very useful as the nanocrystalline silicon is being investigated for its use in developing high efficiency silicon solar structures.

Analysis of Reflection High Energy Electron Diffraction Pattern of Silicon Carbide Grown on Silicon

1995 ◽  
Vol 399 ◽  
Author(s):  
G. Teichert ◽  
J. Pezoldt ◽  
V. Cimalla ◽  
O. Nennewitz ◽  
L. Spiess
Keyword(s):  
Silicon Carbide ◽  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Process Parameters ◽  
Electron Diffraction Pattern ◽  
Lattice Relaxation ◽  
High Energy ◽  
Morphology Evolution ◽  
Rheed Pattern ◽  
High Energy Electron

ABSTRACTRHEED pattern of SiC layers on both (100) and (111)Si grown by carbonization were studied. Different deviations from the single crystalline structure were found ranging from twinning up to changes in the orientation and textured growth. Special attention was drawn on lattice relaxation and morphology evolution during the growth of the formed SiC. Relationships between the occurrence of typical RHEED pattern and the morphology and process parameters are presented.

Polytypoids in high Tc thallium based superconducting materials

1990 ◽  
Vol 5 (8) ◽  
pp. 1620-1624
Author(s):  
A. K. Singh ◽  
M. A. Imam ◽  
K. Sadananda ◽  
S. B. Qadri ◽  
E. F. Skelton ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Electron Diffraction Pattern ◽  
Stacking Faults ◽  
Superconducting Materials ◽  
Superconducting Properties ◽  
High Tc ◽  
Transmission Electron

Several high Tc compounds containing Tl (thallium) were prepared starting from different initial compositions. Superconducting properties and the structure were determined for each sample. Electron diffraction and transmission electron microscopy showed the existence of polytypic high Tc compounds with the same a- and b-axes but different c-axis values. The c-axis appears to increase approximately in integral multiples of 0.15 nm with varying composition and is associated with the insertion of Cu–Ca or Cu–Tl layers in each unit cell. Several random stacking faults were also noted, which give rise to diffuse streaking in the electron diffraction pattern.

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