scholarly journals Photon pair generation in hydrogenated amorphous silicon microring resonators

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Elizabeth Hemsley ◽  
Damien Bonneau ◽  
Jason Pelc ◽  
Ray Beausoleil ◽  
Jeremy L. O’Brien ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Photon Pair ◽  
Microring Resonators ◽  
Pair Generation ◽  
Hydrogenated Amorphous

Multichannel photon-pair generation using hydrogenated amorphous silicon waveguides

2014 ◽  
Vol 39 (4) ◽  
pp. 914 ◽  
Author(s):  
Ke-Yao Wang ◽  
Vesselin G. Velev ◽  
Kim Fook Lee ◽  
Abijith S. Kowligy ◽  
Prem Kumar ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Photon Pair ◽  
Silicon Waveguides ◽  
Pair Generation ◽  
Hydrogenated Amorphous

scholarly journals Picosecond all-optical switching in hydrogenated amorphous silicon microring resonators

2014 ◽  
Vol 22 (4) ◽  
pp. 3797 ◽  
Author(s):  
Jason S. Pelc ◽  
Kelley Rivoire ◽  
Sonny Vo ◽  
Charles Santori ◽  
David A. Fattal ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Optical Switching ◽  
Hydrogenated Amorphous Silicon ◽  
Microring Resonators ◽  
All Optical ◽  
Hydrogenated Amorphous ◽  
All Optical Switching

BONDING IN HYDROGENATED AMORPHOUS SILICON

1981 ◽  
Vol 42 (C4) ◽  
pp. C4-773-C4-777 ◽  
Author(s):  
H. R. Shanks ◽  
F. R. Jeffrey ◽  
M. E. Lowry
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Hydrogenated Amorphous

High Rate Deposition of Stable Hydrogenated Amorphous Silicon in Transition from Amorphous to Microcrystalline Silicon

2003 ◽  
Vol 762 ◽  
Author(s):  
Guofu Hou ◽  
Xinhua Geng ◽  
Xiaodan Zhang ◽  
Ying Zhao ◽  
Junming Xue ◽  
...  
Keyword(s):  
Phase Transition ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
High Rate ◽  
Very High Frequency ◽  
High Quality ◽  
Working Pressure ◽  
Hydrogen Dilution ◽  
Hydrogenated Amorphous

AbstractHigh rate deposition of high quality and stable hydrogenated amorphous silicon (a-Si:H) films were performed near the threshold of amorphous to microcrystalline phase transition using a very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) method. The effect of hydrogen dilution on optic-electronic and structural properties of these films was investigated by Fourier-transform infrared (FTIR) spectroscopy, Raman scattering and constant photocurrent method (CPM). Experiment showed that although the phase transition was much influenced by hydrogen dilution, it also strongly depended on substrate temperature, working pressure and plasma power. With optimized condition high quality and high stable a-Si:H films, which exhibit σph/σd of 4.4×106 and deposition rate of 28.8Å/s, have been obtained.

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