scholarly journals Electrochemical deposition of layered copper thin films based on the diffusion limited aggregation

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Chenhuinan Wei ◽  
Guoxing Wu ◽  
Sanjun Yang ◽  
Qiming Liu
Keyword(s):  
Thin Films ◽  
Electrochemical Deposition ◽  
Diffusion Limited Aggregation ◽  
Diffusion Limited

scholarly journals Synthesis of Cobalt Oxides Thin Films Fractal Structures by Laser Chemical Vapor Deposition

2014 ◽  
Vol 2014 ◽  
pp. 1-6 ◽  
Author(s):  
P. Haniam ◽  
C. Kunsombat ◽  
S. Chiangga ◽  
A. Songsasen
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Cobalt Oxides ◽  
Fractal Structures ◽  
Laser Chemical Vapor Deposition ◽  
Diffusion Limited Aggregation ◽  
Diffusion Limited

Thin films of cobalt oxides (CoO and Co3O4) fractal structures have been synthesized by using laser chemical vapor deposition at room temperature and atmospheric pressure. Various factors which affect the density and crystallization of cobalt oxides fractal shapes have been examined. We show that the fractal structures can be described by diffusion-limited aggregation model and discuss a new possibility to control the fractal structures.

Observation of fractal patterns in C60-polymer thin films

1994 ◽  
Vol 9 (9) ◽  
pp. 2216-2218 ◽  
Author(s):  
H.J. Gao ◽  
Z.Q. Xue ◽  
Q.D. Wu ◽  
S. Pang
Keyword(s):  
Thin Films ◽  
Fractal Dimension ◽  
Long Range ◽  
Diffusion Limited Aggregation ◽  
Aggregation Model ◽  
Diffusion Limited ◽  
Range Correlation ◽  
Microscopic Features ◽  
Fractal Patterns ◽  
Cluster Diffusion

We report the observation of fractal patterns in C60-tetracyanoquinodimethane thin films. The fractal patterns and their microscopic features are described and characterized. The fractal dimension was determined to be 1.69 ± 0.07. According to the characterization results, the observed fractals are compared to the cluster-diffusion-limited-aggregation model. The growth of the fractal patterns in the thin films is also in terms of the existing long-range correlation.

Computer Simulation of Fatigue in Ferroelectric Thin Films by a Modified Diffusion Limited Aggregation Model with Drift

1995 ◽  
Vol 34 (Part 2, No. 1A) ◽  
pp. L51-L53 ◽  
Author(s):  
Xingjiao Li ◽  
Jianshe Liu ◽  
Dexin Lu ◽  
Jianhong Zhao ◽  
Longbo Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Computer Simulation ◽  
Ferroelectric Thin Films ◽  
Diffusion Limited Aggregation ◽  
Aggregation Model ◽  
Diffusion Limited

Anisotropy and Cluster Growth by Diffusion-Limited Aggregation

1985 ◽  
Vol 55 (13) ◽  
pp. 1406-1409 ◽  
Author(s):  
Robin C. Ball ◽  
Robert M. Brady ◽  
Giuseppe Rossi ◽  
Bernard R. Thompson
Keyword(s):  
Cluster Growth ◽  
Diffusion Limited Aggregation ◽  
Diffusion Limited
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