Low temperature plasma enhanced CVD epitaxial growth of silicon on GaAs: a new paradigm for III-V/Si integration
Keyword(s):
1989 ◽
Vol 36
(1-4)
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pp. 23-38
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Keyword(s):
Keyword(s):
1995 ◽
Vol 05
(C5)
◽
pp. C5-711-C5-715
◽
Keyword(s):
Keyword(s):
Transparent Silica Films Deposited by Low-Temperature Plasma-Enhanced CVD Using Hexamethyldisiloxane
2002 ◽
Vol 8
(6)
◽
pp. 251-253
◽
Keyword(s):
1997 ◽
Vol 117
(10)
◽
pp. 1262-1268
◽
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
◽
pp. 457-466