scholarly journals Epitaxial growth and magnetic properties of ultraviolet transparent Ga2O3/(Ga1−xFex)2O3 multilayer thin films

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Daoyou Guo ◽  
Yuehua An ◽  
Wei Cui ◽  
Yusong Zhi ◽  
Xiaolong Zhao ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Epitaxial Growth ◽  
Multilayer Thin Films

Effect of finite interfacial diffusion on microstructure, magnetic properties and hardness of FePt/B4C multilayer thin films

2008 ◽  
Vol 41 (15) ◽  
pp. 155310 ◽  
Author(s):  
Fujun Yang ◽  
Hao Wang ◽  
Baoyuan Wang ◽  
Hanbin Wang ◽  
Changping Yang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Multilayer Thin Films ◽  
Interfacial Diffusion

Temperature dependence of microstructure and magnetic properties of Co/Ti multilayer thin films

1997 ◽  
Vol 81 (11) ◽  
pp. 7301-7305 ◽  
Author(s):  
Ping Wu ◽  
E. Y. Jiang ◽  
C. D. Wang ◽  
H. L. Bai ◽  
H. Y. Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Temperature Dependence ◽  
Multilayer Thin Films ◽  
Microstructure And Magnetic Properties

Impact of Deposition Rate on the Structural and Magnetic Properties of Sputtered Ni/Cu Multilayer Thin Films

2017 ◽  
Vol 73 (1) ◽  
pp. 85-90 ◽  
Author(s):  
Ali Karpuz ◽  
Salih Colmekci ◽  
Hakan Kockar ◽  
Hilal Kuru ◽  
Mehmet Uckun
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Deposition Rate ◽  
High Rate ◽  
Cubic Phase ◽  
High Deposition Rate ◽  
Multilayer Thin Films ◽  
Face Centered Cubic ◽  
Deposition Rates ◽  
Cu Films

AbstractThe structural and corresponding magnetic properties of Ni/Cu films sputtered at low and high deposition rates were investigated as there is a limited number of related studies in this field. 5[Ni(10 nm)/Cu(30 nm)] multilayer thin films were deposited using two DC sputtering sources at low (0.02 nm/s) and high (0.10 nm/s) deposition rates of Ni layers. A face centered cubic phase was detected for both films. The surface of the film sputtered at the low deposition rate has a lot of micro-grains distributed uniformly and with sizes from 0.1 to 0.4 μm. Also, it has a vertical acicular morphology. At high deposition rate, the number of micro-grains considerably decreased, and some of their sizes increased up to 1 μm. The surface of the Ni/Cu multilayer deposited at the low rate has a relatively more grainy and rugged structure, whereas the surface of the film deposited at the high rate has a relatively larger lateral size of surface grains with a relatively fine morphology. Saturation magnetisation, Ms, values were 90 and 138 emu/cm3 for deposition rates of 0.02 and 0.10 nm/s, respectively. Remanence, Mr, values were also found to be 48 and 71 emu/cm3 for the low and high deposition rates, respectively. The coercivity, Hc, values were 46 and 65 Oe for the low and high Ni deposition rates, respectively. The changes in the film surfaces provoked the changes in the Hc values. The Ms, Mr, and Hc values of the 5[Ni(10 nm)/Cu(30 nm)] films can be adjusted considering the surface morphologies and film contents caused by the different Ni deposition rates.

scholarly journals Epitaxial growth and magnetic properties of Cr-doped AlN thin films

2005 ◽  
Vol 17 (21) ◽  
pp. 3137-3142 ◽  
Author(s):  
Jun Zhang ◽  
S H Liou ◽  
D J Sellmyer
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Epitaxial Growth
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