scholarly journals Extreme tunability in aluminum doped Zinc Oxide plasmonic materials for near-infrared applications

2014 ◽  
Vol 4 (1) ◽  
Author(s):  
A. K. Pradhan ◽  
R. M. Mundle ◽  
Kevin Santiago ◽  
J. R. Skuza ◽  
Bo Xiao ◽  
...  
2014 ◽  
Vol 47 (33) ◽  
pp. 335104 ◽  
Author(s):  
Xing Wang ◽  
Fang Fang ◽  
Zisheng Su ◽  
Xuan Fang ◽  
Guang Zhang ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (81) ◽  
pp. 42758-42763 ◽  
Author(s):  
Haifeng Zhou ◽  
Hua Wang ◽  
Kang Zheng ◽  
Zhen Gu ◽  
Zhaofeng Wu ◽  
...  

Aluminum-doped ZnO nanoparticles with tunable NIR absorption.


2013 ◽  
Vol 667 ◽  
pp. 511-515 ◽  
Author(s):  
N.D. Md Sin ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop

The properties of nanostructured aluminum (Al) doped zinc oxide (ZnO) thin film for thin film transistors (TFT) are presented. This research has been focused on optical and structural properties of Al doped ZnO thin film. The influence of Al doping concentration at 0~5 at.% on the Al doped ZnO thin film properties have been investigated. The thin films were characterized using UV-Vis-NIR spectrophotometer for optical properties. The surface morphology has been characterized using field emission scanning electron microscope (FESEM). The absorption coefficient spectra obtained from UV-Vis-NIR spectrophotometer measurement show all films have low absorbance in visible and near infrared (IR) region but have high UV absorption properties. The calculated Urbach energy indicated the defects concentrations in the thin films increase with doping concentrations The FESEM investigations shows that the nanoparticles size becomes smaller and denser as the doping concentration increase.


2008 ◽  
Vol 517 (3) ◽  
pp. 1262-1267 ◽  
Author(s):  
Deuk Yong Lee ◽  
Jung-Eun Cho ◽  
Nam-Ihn Cho ◽  
Myung-Hyun Lee ◽  
Se-Jong Lee ◽  
...  

Materials ◽  
2012 ◽  
Vol 5 (8) ◽  
pp. 1404-1412 ◽  
Author(s):  
Thrinath Reddy Ramireddy ◽  
Velmurugan Venugopal ◽  
Jagadeesh Babu Bellam ◽  
Arturo Maldonado ◽  
Jaime Vega-Pérez ◽  
...  

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