A Molecular Beam Reactor for examining the Rate, and Primary Products, of Reactive Bimolecular Collisions

Nature ◽  
1961 ◽  
Vol 191 (4790) ◽  
pp. 798-799
Author(s):  
C. W. NUTT ◽  
A. J. BIDDLESTONE
Keyword(s):  
Molecular Beam ◽  
Primary Products ◽  
Bimolecular Collisions

Reaction Dynamics of O(3P) + Propyne: I. Primary Products, Branching Ratios, and Role of Intersystem Crossing from Crossed Molecular Beam Experiments

2016 ◽  
Vol 120 (27) ◽  
pp. 4603-4618 ◽  
Author(s):  
Gianmarco Vanuzzo ◽  
Nadia Balucani ◽  
Francesca Leonori ◽  
Domenico Stranges ◽  
Vaclav Nevrly ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Reaction Dynamics ◽  
Branching Ratios ◽  
Intersystem Crossing ◽  
Primary Products ◽  
Crossed Molecular Beam

scholarly journals Reactive Bimolecular Collisions Studied With Combined Pulsed Lasers and Pulsed, Crossed, Supersonic Molecular Beams

1990 ◽  
Vol 10 (5-6) ◽  
pp. 367-376 ◽  
Author(s):  
M. Costes ◽  
C. Naulin ◽  
G. Dorthe ◽  
Z. Moudden
Keyword(s):  
Molecular Beam ◽  
Collision Energy ◽  
Ultra Violet ◽  
Molecular Beams ◽  
High Signal ◽  
Pulsed Lasers ◽  
Laser Induced Fluorescence Detection ◽  
Supersonic Molecular Beams ◽  
Molecular Reaction ◽  
Bimolecular Collisions

Pulsed, supersonic molecular beams and pulsed lasers are particularly well matched tools when combined in molecular reaction dynamics studies. Salient features of an experiment using two pulsed molecular beam sources, a pulsed ultra-violet laser for creating reactive atoms by laser ablation and a pulsed dye laser for performing laser-induced fluorescence detection of the products are described. Differences with steady-state molecular beam experiments are outlined with respect to the following points: facility of inverting the data, possibility of obtaining high signal-to-background ratios and wide ranges of collision energy. These points are illustrated with some results concerning the reactions:C(n3P)J + NO(Xπr2)→ CN(X2Σ2) + O(n3PJ),C(n3PJ) + N2O(X1Σ+) →CN(X2Σ+) + NO(Xπr2)and Mg(n1S0) + N2O(X1Σ+) →MgO(X1Σ+) + N2(X1Σg+)

Crossed Molecular Beam Dynamics Studies of the O(3P) + Allene Reaction: Primary Products, Branching Ratios, and Dominant Role of Intersystem Crossing

2011 ◽  
Vol 3 (1) ◽  
pp. 75-80 ◽  
Author(s):  
Francesca Leonori ◽  
Angela Occhiogrosso ◽  
Nadia Balucani ◽  
Alberto Bucci ◽  
Raffaele Petrucci ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Dominant Role ◽  
Branching Ratios ◽  
Beam Dynamics ◽  
Intersystem Crossing ◽  
Primary Products ◽  
Crossed Molecular Beam

Defects in Heavily-Doped MBE GaAs

1982 ◽  
Vol 40 ◽  
pp. 442-445
Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Heavily Doped

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.

STM studies of crystal growth

1991 ◽  
Vol 49 ◽  
pp. 374-375
Author(s):  
M. G. Lagally
Keyword(s):  
Crystal Growth ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Sputter Deposition ◽  
Field Of View ◽  
Scanning Tunneling ◽  
Wide Field ◽  
Tunneling Microscopy ◽  
Wide Field Of View ◽  
The One

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.

An in situ and ex situ TEM study of the formation of thin cobalt silicide films by molecular beam epitaxy on the silicon (100) surface

1988 ◽  
Vol 46 ◽  
pp. 884-885
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Defect Density ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Metal Base ◽  
In Situ Experiments ◽  
Potential Applications

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.

Near-Surface Aggregation of Sn In Heavily Sn-Doped GaAs Films Grown By Molecular Beam Epitaxy

1985 ◽  
Vol 43 ◽  
pp. 368-369
Author(s):  
S. H. Chen
Keyword(s):  
Molecular Beam Epitaxy ◽  
Cross Section ◽  
Electron Spectroscopy ◽  
Molecular Beam ◽  
Surface Segregation ◽  
Secondary Ion Mass Spectrometry ◽  
Specimen Preparation ◽  
Near Surface ◽  
Gaas Films ◽  
Secondary Ion

Sn has been used extensively as an n-type dopant in GaAs grown by molecular-beam epitaxy (MBE). The surface accumulation of Sn during the growth of Sn-doped GaAs has been observed by several investigators. It is still not clear whether the accumulation of Sn is a kinetically hindered process, as proposed first by Wood and Joyce, or surface segregation due to thermodynamic factors. The proposed donor-incorporation mechanisms were based on experimental results from such techniques as secondary ion mass spectrometry, Auger electron spectroscopy, and C-V measurements. In the present study, electron microscopy was used in combination with cross-section specimen preparation. The information on the morphology and microstructure of the surface accumulation can be obtained in a fine scale and may confirm several suggestions from indirect experimental evidence in the previous studies.

Effects of substrate quality and annealing on defect structures at GaAs/Si interfaces

1987 ◽  
Vol 45 ◽  
pp. 340-341
Author(s):  
H. L. Tsai ◽  
J. W. Lee
Keyword(s):  
Growth Process ◽  
Molecular Beam ◽  
Substrate Surface ◽  
Lattice Misfit ◽  
Device Fabrication ◽  
Silicon Substrates ◽  
Defect Structures ◽  
Gaas Film ◽  
Substrate Quality ◽  
Gaas On Si

Growth of GaAs on Si using epitaxial techniques has been receiving considerable attention for its potential application in device fabrication. However, because of the 4% lattice misfit between GaAs and Si, defect generation at the GaAs/Si interface and its propagation to the top portion of the GaAs film occur during the growth process. The performance of a device fabricated in the GaAs-on-Si film can be degraded because of the presence of these defects. This paper describes a HREM study of the effects of both the substrate surface quality and postannealing on the defect propagation and elimination.The silicon substrates used for this work were 3-4 degrees off [100] orientation. GaAs was grown on the silicon substrate by molecular beam epitaxy (MBE).

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