Photoelectron Spectra of Organometallic Compounds Containing Silicon-Silicon and Silicon-Germanium Bonds: Valence Band Studies

1994 ◽  
Vol 13 (9) ◽  
pp. 3671-3678 ◽  
Author(s):  
Douglas G. J. Sutherland ◽  
Jian Z. Xiong ◽  
Zhifeng Liu ◽  
T. K. Sham ◽  
G. Michael Bancroft ◽  
...  
1998 ◽  
Vol 512 ◽  
Author(s):  
C. Koitzscht ◽  
M. O'Brient ◽  
D. Johri ◽  
A. Stoltzt ◽  
R. Nemanicht

ABSTRACTPhotoemission spectroscopy (UPS) was used to investigate the interface properties of deposited silicon on hexagonal 6H-silicon carbide. SiC cleaned in Si flux from a molecular beam epitaxy (MBE) system was used for this study. All processes were accomplished in an ultra high vacuum integrated system that allowed all cleaning, deposition, and analysis to be completed without exposure to ambient atmosphere. Thicknesses of sub- to multiple monolayers were deposited and the valence band structure was investigated. The valence band maximum (VBM) was observed to shift for Si depositions greater than 1 monolayer. The VBM offset was determined to be 2.4eV for a layer of 60Å Si on SiC. Furthermore, the prominent surface state feature of the silicon carbide (0001)si surface is reduced after Si deposition. The results are discussed in terms of the electronic properties of the Si – SiC interface.


2014 ◽  
Vol 215 ◽  
pp. 28-34 ◽  
Author(s):  
Michael A. Korotin ◽  
Nikolay A. Skorikov ◽  
Ernst Z. Kurmaev ◽  
Dmitry A. Zatsepin ◽  
Seif O. Cholakh

X-ray photoelectron spectra of TiO2:Fe are measured. Electronic structure and magnetic properties of rutile doped by iron are calculated in frames of the coherent potential approximation. The main experimental spectral features of TiO2:Fe such as heterovalent cation substitution (Fe3+→Ti4+), decreasing of the band gap value and appearance of additional features at the bottom and top of X-ray photoelectron spectra of valence band in comparison with those for undoped TiO2 are described.


1986 ◽  
Vol 33 (4) ◽  
pp. 2370-2379 ◽  
Author(s):  
H. Winter ◽  
P. J. Durham ◽  
W. M. Temmerman ◽  
G. M. Stocks

1989 ◽  
Vol 149 ◽  
Author(s):  
J. P. Conde ◽  
V. Chu ◽  
S. Wagner

ABSTRACTThe electron and hole transport perpendicular to the plane of the layers in a-Si:H, F/a-Si, Ge:H, F multilayers is analyzed. We measure the electron dark conductivity σd and its activation energy Ea, d, the photo conductivity σph and its exponent γ, the electron and hole mobility-deep trapping lifetime (μτd)e, h and the hole mobility-recombination lifetime (μτr)h. We identify three regions of barrier thickness ds with very different transport properties: (a) ds≲50Å, dominated by tunnelling between quantum confined states in the bottom of the wells; (b) 50Å ≲ds≲200Å, in which the well acts as the provider of an extra, controllable tail state density; and (c) ds≳200Å, where the individual layers are essentially decoupled.


1973 ◽  
Vol 22 (3) ◽  
pp. 489-494 ◽  
Author(s):  
R. Bastasz ◽  
David Cahen ◽  
Joseph E. Lester ◽  
Jayaraman Rajaram

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