Fast Synthesis of High-Performance Graphene Films by Hydrogen-Free Rapid Thermal Chemical Vapor Deposition

ACS Nano ◽  
2014 ◽  
Vol 8 (1) ◽  
pp. 950-956 ◽  
Author(s):  
Jaechul Ryu ◽  
Youngsoo Kim ◽  
Dongkwan Won ◽  
Nayoung Kim ◽  
Jin Sung Park ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Chemical Vapor ◽  
Thermal Chemical Vapor Deposition ◽  
Graphene Films ◽  
Fast Synthesis

Synthesis of high-quality graphene films on nickel foils by rapid thermal chemical vapor deposition

Carbon ◽  
2012 ◽  
Vol 50 (2) ◽  
pp. 551-556 ◽  
Author(s):  
L. Huang ◽  
Q.H. Chang ◽  
G.L. Guo ◽  
Y. Liu ◽  
Y.Q. Xie ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Quality ◽  
Thermal Chemical Vapor Deposition ◽  
Graphene Films

Rapid Thermal Chemical Vapor Deposition of Nitrogen-Doped Polysilicon for High-Performance and High-Reliability CMOS Technology

1995 ◽  
Vol 387 ◽  
Author(s):  
S. C. Sun ◽  
L. S. Wang ◽  
F. L. Yeh
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Film Growth ◽  
High Reliability ◽  
Chemical Vapor ◽  
Cmos Technology ◽  
Polysilicon Film ◽  
Thermal Chemical Vapor Deposition ◽  
Nitrogen Doped

AbstractIn this paper, a detailed study is presented for the growth kinetics of rapid thermal chemical vapor deposition (RTCVD) of nitrogen-doped polysilicon using silane and ammonia chemistry. It is found that nitrogen doping has reduced the surface roughness and grain size of the RTCVD polysilicon film. Both the deposition rate and the incubation time of film growth depend strongly on the ammonia to silane flow ratio. We have proposed a novel structure of NICER (Nitrogen Incorporation into CMOS Gate Electrode by in-situ RTCVD). High performance and highly reliable dual gate CMOS can be formed by combining rapid thermal oxidation (RTO) with RTCVD.

Ultra-smooth and robust graphene-based hybrid anode for high-performance flexible organic light-emitting diodes

2021 ◽  
Author(s):  
zhikun zhang ◽  
lianlian xia ◽  
Lizhao Liu ◽  
Yuwen Chen ◽  
zuozhi wang ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Light Emitting Diodes ◽  
Chemical Vapor ◽  
Organic Light Emitting Diodes ◽  
Light Emitting ◽  
Organic Light ◽  
Large Particles

Large surface roughness, especially caused by the large particles generated during both the transfer and the doping processes of graphene grown by chemical vapor deposition (CVD) is always a critical...

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