Site-Selective Deposition of Twinned Platinum Nanoparticles on TiSi2 Nanonets by Atomic Layer Deposition and Their Oxygen Reduction Activities

ACS Nano ◽  
2013 ◽  
Vol 7 (7) ◽  
pp. 6337-6345 ◽  
Author(s):  
Jin Xie ◽  
Xiaogang Yang ◽  
Binghong Han ◽  
Yang Shao-Horn ◽  
Dunwei Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Platinum Nanoparticles ◽  
Atomic Layer ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Site Selective

scholarly journals Bottom-Up Fabrication of Oxygen Reduction Electrodes with Atomic Layer Deposition for High-Power-Density PEMFCs

2021 ◽  
Vol 2 (1) ◽  
pp. 100297
Author(s):  
Samuel M. Dull ◽  
Shicheng Xu ◽  
Timothy Goh ◽  
Dong Un Lee ◽  
Drew Higgins ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Power Density ◽  
High Power ◽  
Atomic Layer ◽  
High Power Density ◽  
Bottom Up ◽  
Layer Deposition

Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition

2021 ◽  
Author(s):  
Seunghwan Lee ◽  
GeonHo Baek ◽  
Hye-mi Kim ◽  
Yong-Hwan Kim ◽  
Jin-Seong Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Amorphous Structures

Metalcone films can be rearranged from amorphous structures to 2D-like carbon by electron beam irradiation. The irradiated indicone (HQ) film can be used as an inhibitor for selective deposition delaying 20 cycles of ALD of ZnO.

scholarly journals Influence of the Geometric Parameters on the Deposition Mode in Spatial Atomic Layer Deposition: A Novel Approach to Area-Selective Deposition

Coatings ◽  
2018 ◽  
Vol 9 (1) ◽  
pp. 5 ◽  
Author(s):  
César Masse de la Huerta ◽  
Viet Nguyen ◽  
Jean-Marc Dedulle ◽  
Daniel Bellet ◽  
Carmen Jiménez ◽  
...  
Keyword(s):  
Fluid Dynamics ◽  
Atomic Layer Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Dynamics Simulation ◽  
Selective Deposition ◽  
Temporal Separation ◽  
Present Contribution ◽  
Chemical Vapor Deposition Growth ◽  
Layer Deposition

Within the materials deposition techniques, Spatial Atomic Layer Deposition (SALD) is gaining momentum since it is a high throughput and low-cost alternative to conventional atomic layer deposition (ALD). SALD relies on a physical separation (rather than temporal separation, as is the case in conventional ALD) of gas-diluted reactants over the surface of the substrate by a region containing an inert gas. Thus, fluid dynamics play a role in SALD since precursor intermixing must be avoided in order to have surface-limited reactions leading to ALD growth, as opposed to chemical vapor deposition growth (CVD). Fluid dynamics in SALD mainly depends on the geometry of the reactor and its components. To quantify and understand the parameters that may influence the deposition of films in SALD, the present contribution describes a Computational Fluid Dynamics simulation that was coupled, using Comsol Multiphysics®, with concentration diffusion and temperature-based surface chemical reactions to evaluate how different parameters influence precursor spatial separation. In particular, we have used the simulation of a close-proximity SALD reactor based on an injector manifold head. We show the effect of certain parameters in our system on the efficiency of the gas separation. Our results show that the injector head-substrate distance (also called deposition gap) needs to be carefully adjusted to prevent precursor intermixing and thus CVD growth. We also demonstrate that hindered flow due to a non-efficient evacuation of the flows through the head leads to precursor intermixing. Finally, we show that precursor intermixing can be used to perform area-selective deposition.

Nucleation and growth process of atomic layer deposition platinum nanoparticles on strontium titanate nanocuboids

2017 ◽  
Vol 28 (18) ◽  
pp. 185704 ◽  
Author(s):  
Chuandao Wang ◽  
Linhua Hu ◽  
Kenneth Poeppelmeier ◽  
Peter C Stair ◽  
Laurence Marks
Keyword(s):  
Atomic Layer Deposition ◽  
Strontium Titanate ◽  
Platinum Nanoparticles ◽  
Growth Process ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Layer Deposition

Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance

2021 ◽  
Vol 39 (3) ◽  
pp. 032416
Author(s):  
Taguhi Yeghoyan ◽  
Vincent Pesce ◽  
Moustapha Jaffal ◽  
Gauthier Lefevre ◽  
Rémy Gassilloud ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Selective Deposition ◽  
Layer Deposition

Active MnOxElectrocatalysts Prepared by Atomic Layer Deposition for Oxygen Evolution and Oxygen Reduction Reactions

2012 ◽  
Vol 2 (10) ◽  
pp. 1269-1277 ◽  
Author(s):  
Katie L. Pickrahn ◽  
Sang Wook Park ◽  
Yelena Gorlin ◽  
Han-Bo-Ram Lee ◽  
Thomas F. Jaramillo ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Oxygen Evolution ◽  
Atomic Layer ◽  
Reduction Reactions ◽  
Oxygen Reduction Reactions ◽  
Layer Deposition

scholarly journals Surface Modification of Catalysts via Atomic Layer Deposition for Pollutants Elimination

Catalysts ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1298
Author(s):  
Xiaofeng Wang ◽  
Zhe Zhao ◽  
Chengcheng Zhang ◽  
Qingbo Li ◽  
Xinhua Liang
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Environmental Remediation ◽  
Particle Deposition ◽  
Nanostructured Catalysts ◽  
Atomic Layer ◽  
Catalytic Performance ◽  
Selective Deposition ◽  
Conformal Coating ◽  
Layer Deposition

In recent years, atomic layer deposition (ALD) is widely used for surface modification of materials to improve the catalytic performance for removing pollutants, e.g., CO, hydrocarbons, heavy metal ions, and organic pollutants, and much progress has been achieved. In this review, we summarize the recent development of ALD applications in environmental remediation from the perspective of surface modification approaches, including conformal coating, uniform particle deposition, and area-selective deposition. Through the ALD conformal coating, the activity of photocatalysts improved. Uniform particle deposition is used to prepare nanostructured catalysts via ALD for removal of air pollutions and dyes. Area-selective deposition is adopted to cover the specific defects on the surface of materials and synthesize bimetallic catalysts to remove CO and other contaminations. In addition, the design strategy of catalysts and shortcomings of current studies are discussed in each section. At last, this review points out some potential research trends and comes up with a few routes to further improve the performance of catalysts via ALD surface modification and deeper investigate the ALD reaction mechanisms.

scholarly journals Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition

2011 ◽  
Vol 158 (1) ◽  
pp. D1 ◽  
Author(s):  
Woo-Hee Kim ◽  
Han-Bo-Ram Lee ◽  
Kwang Heo ◽  
Young Kuk Lee ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Selective Deposition ◽  
Layer Deposition
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