Two-Dimensional Ordering in Block Copolymer Monolayer Thin Films upon Selective Solvent Annealing

2008 ◽  
Vol 41 (15) ◽  
pp. 5799-5808 ◽  
Author(s):  
You Wang ◽  
Xiaodong Hong ◽  
Baoquan Liu ◽  
Changyou Ma ◽  
Chunfang Zhang
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Two Dimensional ◽  
Selective Solvent ◽  
Solvent Annealing

Dynamics of dislocations in a two-dimensional block copolymer system with hexagonal symmetry

2011 ◽  
Vol 369 (1935) ◽  
pp. 335-350 ◽  
Author(s):  
Aldo D. Pezzutti ◽  
Daniel A. Vega ◽  
Marcelo A. Villar
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Topological Defects ◽  
Two Dimensional ◽  
Significant Progress ◽  
Hexagonal Symmetry ◽  
Scale Selection ◽  
Long Range Ordering ◽  
Lithographic Masks

Block copolymer thin films have attracted considerable attention for their ability to self-assemble into nanometre-scale architectures. Recent advances in the use of block copolymer thin films as nano-lithographic masks have driven research efforts in order to have better control of long-range ordering in the plane of the film. Irrespective of the method of sample preparation, different quasi-two-dimensional systems with hexagonal symmetry unavoidably contain translational defects, called dislocations. Dislocations control the process of coarsening in the nano/meso-scales and provide one of the most important mechanisms of length-scale selection in hexagonal patterns. Although in the last decade the nonlinear dynamics of topological defects in quasi-two-dimensional systems has witnessed significant progress, still little is known about the role of external fields on the creation and annihilation mechanisms involved in the relaxation process towards equilibrium states. In this paper, the dynamics of dislocations in non-optimal hexagonal patterns is studied in the framework of the Ohta–Kawasaki model for a diblock copolymer. Measurements of the climb and glide velocities as a function of the wave vector deformation reveal the main mechanisms of relaxation associated with the motion of dislocations.

Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

2006 ◽  
Vol 532-533 ◽  
pp. 165-168
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Low Cost ◽  
Orientational Order ◽  
Solvent Annealing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ordered Nanostructures ◽  
Self Assembled

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing

2014 ◽  
Vol 4 (1) ◽  
pp. 11-15 ◽  
Author(s):  
Su-Mi Hur ◽  
Gurdaman S. Khaira ◽  
Abelardo Ramírez-Hernández ◽  
Marcus Müller ◽  
Paul F. Nealey ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Defect Reduction ◽  
Solvent Annealing

Controlled Ordering of Block Copolymer Gyroid Thin Films by Solvent Annealing

2013 ◽  
Vol 47 (1) ◽  
pp. 175-182 ◽  
Author(s):  
Ming-Shiuan She ◽  
Ting-Ya Lo ◽  
Rong-Ming Ho
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing

Ordering evolution of block copolymer thin films upon solvent-annealing process

2012 ◽  
Vol 383 (1) ◽  
pp. 118-123 ◽  
Author(s):  
Dong Hyun Lee ◽  
Heesook Cho ◽  
Seungmin Yoo ◽  
Soojin Park
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Annealing Process ◽  
Solvent Annealing

An Optical Waveguide Study on the Nanopore Formation in Block Copolymer/Homopolymer Thin Films by Selective Solvent Swelling

2006 ◽  
Vol 110 (31) ◽  
pp. 15381-15388 ◽  
Author(s):  
Dong Ha Kim ◽  
King Hang Aaron Lau ◽  
Wonchul Joo ◽  
Juan Peng ◽  
Unyong Jeong ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Optical Waveguide ◽  
Selective Solvent ◽  
Solvent Swelling

Cyclic Solvent Annealing Improves Feature Orientation in Block Copolymer Thin Films

2016 ◽  
Vol 49 (5) ◽  
pp. 1743-1751 ◽  
Author(s):  
Sean P. Paradiso ◽  
Kris T. Delaney ◽  
Carlos J. García-Cervera ◽  
Hector D. Ceniceros ◽  
Glenn H. Fredrickson
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing

Mechanisms of ordering in block copolymer sub-monolayer films upon selective solvent annealing

Polymer ◽  
2013 ◽  
Vol 54 (21) ◽  
pp. 6036-6044 ◽  
Author(s):  
Xiaodong Hong ◽  
Binsong Wang ◽  
Hao Wang ◽  
You Wang
Keyword(s):  
Block Copolymer ◽  
Selective Solvent ◽  
Monolayer Films ◽  
Solvent Annealing
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