Symmetric Diblock Copolymer Thin Films on Rough Substrates. Kinetics and Structure Formation in Pure Block Copolymer Thin Films

2005 ◽  
Vol 38 (5) ◽  
pp. 1837-1849 ◽  
Author(s):  
E. Sivaniah ◽  
Y. Hayashi ◽  
S. Matsubara ◽  
S. Kiyono ◽  
T. Hashimoto ◽  
...  
2016 ◽  
Vol 4 (10) ◽  
pp. 2017-2027 ◽  
Author(s):  
Dongwoo Wi ◽  
Jonghyun Kim ◽  
Hoyeol Lee ◽  
Nam-Goo Kang ◽  
Jinseok Lee ◽  
...  

Block copolymers bearing carbazole moieties in thin films nicely demonstrated vertical or horizontal lamellar structure depending on the process condition. The vertical lamellar structure revealed permanent memory behavior, where the horizontal lamellar structure exhibited volatile memory behavior.


2016 ◽  
Vol 18 (36) ◽  
pp. 25609-25620 ◽  
Author(s):  
Arnab Mukherjee ◽  
Kumar Ankit ◽  
Andreas Reiter ◽  
Michael Selzer ◽  
Britta Nestler

In this work, the confluence of an electric field, substrate interaction and confinement is shown to induce a parallel lamellar to hexagonally perforated lamellar transition in symmetric block-copolymer thin films.


RSC Advances ◽  
2017 ◽  
Vol 7 (59) ◽  
pp. 37048-37054 ◽  
Author(s):  
Elio Poggi ◽  
Wolfgang Ouvry ◽  
Bruno Ernould ◽  
Jean-Pierre Bourgeois ◽  
Subrata Chattopadhyay ◽  
...  

A nanostructured thin film obtained from a polystyrene-block-poly(4-vinylpyridine) diblock copolymer was used as a template to produce Janus-type nanoparticles via triazolinedione-ene click chemistry.


2000 ◽  
Vol 629 ◽  
Author(s):  
Ratchana Limary ◽  
Peter F. Green

ABSTRACTSymmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.


2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim

2012 ◽  
Vol 45 (23) ◽  
pp. 9531-9538 ◽  
Author(s):  
P. Stasiak ◽  
J. D. McGraw ◽  
K. Dalnoki-Veress ◽  
M. W. Matsen

2003 ◽  
Vol 36 (5) ◽  
pp. 1731-1740 ◽  
Author(s):  
Qiang Wang ◽  
Paul F. Nealey ◽  
Juan J. de Pablo
Keyword(s):  

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