Grain Structure in Block Copolymer Thin Films Studied by Guided Wave Depolarized Light Scattering

2005 ◽  
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Bruce A. Garetz ◽  
Maurice C. Newstein ◽  
Jeffrey D. Wilbur ◽  
Amish J. Patel ◽  
David A. Durkee ◽  
...  
2008 ◽  
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Zhuangxi Fang ◽  
Bruce A. Garetz ◽  
Maurice C. Newstein ◽  
Nitash P. Balsara

2010 ◽  
Vol 43 (23) ◽  
pp. 10071-10077
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Maurice C. Newstein ◽  
Bruce A. Garetz ◽  
Nitash P. Balsara

2014 ◽  
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Jacob L. Thelen ◽  
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Mahati Chintapalli ◽  
Issei Nakamura ◽  
...  

2019 ◽  
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Whitney S. Loo ◽  
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Xin Wang ◽  
Michael D. Galluzzo ◽  
...  

2012 ◽  
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Enrique D. Gomez ◽  
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Bruce A. Garetz ◽  
Nitash P. Balsara

2000 ◽  
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M. Y. Chang ◽  
N. P. Balsara ◽  
B. A. Garetz

Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.


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