Effects of Alkali-Soluble Resin on Latex Film Morphology of Poly(n-butyl methacrylate) Studied by Atomic Force Microscopy

Langmuir ◽  
1998 ◽  
Vol 14 (19) ◽  
pp. 5419-5424 ◽  
Author(s):  
Young-Jun Park ◽  
Doug-Youn Lee ◽  
Mei-Ching Khew ◽  
Chee-Cheong Ho ◽  
Jung-Hyun Kim
Keyword(s):  
Atomic Force Microscopy ◽  
Latex Film ◽  
Butyl Methacrylate ◽  
Film Morphology ◽  
Force Microscopy ◽  
Atomic Force

Atomic force microscopy study of latex film formation

Langmuir ◽  
1992 ◽  
Vol 8 (3) ◽  
pp. 760-762 ◽  
Author(s):  
Yongcai Wang ◽  
Didier Juhue ◽  
Mitchell A. Winnik ◽  
On Man Leung ◽  
M. Cynthia Goh
Keyword(s):  
Atomic Force Microscopy ◽  
Film Formation ◽  
Microscopy Study ◽  
Latex Film ◽  
Atomic Force Microscopy Study ◽  
Force Microscopy ◽  
Atomic Force ◽  
Latex Film Formation

scholarly journals Statistical investigations of an ENIG Nickel film morphology by Atomic Force Microscopy

2016 ◽  
Vol 12 ◽  
pp. 04003
Author(s):  
Rosine Coq Germanicus ◽  
Philippe Leclère ◽  
Eric Hug ◽  
Florent Lallemand ◽  
Philippe Descamps
Keyword(s):  
Atomic Force Microscopy ◽  
Nickel Film ◽  
Film Morphology ◽  
Force Microscopy ◽  
Atomic Force

In Situ Atomic Force Microscopy of Pt/Ti film morphology changes on a microelectronic gas sensor operating at elevated temperatures

1995 ◽  
Vol 53 ◽  
pp. 254-255
Author(s):  
M. DiBattista ◽  
S. V. Patel ◽  
J. F. Mansfield ◽  
J. L. Gland ◽  
J. W. Schwank
Keyword(s):  
Atomic Force Microscopy ◽  
Elevated Temperatures ◽  
Film Surface ◽  
Film Structure ◽  
Film Morphology ◽  
Force Microscopy ◽  
Atomic Force ◽  
Morphology Changes ◽  
Ti Films

Thin film electronic devices that employ resistance change responses of Pt / Ti films to detect gas species have been microfabricated at the University of Michigan. Atomic force microscopy (AFM) is used to investigate morphology of the Pt / Ti sensing films deposited on the microfabricated device. These Pt / Ti sensing films are strongly influenced by many factors, making it difficult to determine the exact relationship between film structure, chemical sensitivity, and selectivity. In-situ AFM investigations of Pt / Ti films on this device at elevated temperatures provides the opportunity for real time observation of film morphology changes under controlled conditions, testing sensing film stability during device operation, and correlating film structure to resistance.Observation of the Pt / Ti film surface and in-situ resistance measurements at elevated temperatures are possible due to the construction of the sensing device. The sensors are based on chemically active thin films deposited on a micromachined silicon window, supported by a 300 μn thick silicon rim.

Growth of C60 Fullerene Films on Semiconductor Surfaces

2003 ◽  
Vol 768 ◽  
Author(s):  
Elena V. Basiuk (Golovataya-Dzhymbeeva) ◽  
José G. Bañuelos ◽  
Alejandro Esparza ◽  
José M. Saniger
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Fourier Transform ◽  
Film Deposition ◽  
C60 Fullerene ◽  
Semiconductor Surfaces ◽  
Film Morphology ◽  
Force Microscopy ◽  
Atomic Force ◽  
Inp Surface

AbstractWe report on a study of vacuum-deposited thin films of C60 fullerene on Si (100) and InP (100) semiconductor surfaces. The film morphology and C60—substrate interactions were investigated by using atomic force microscopy (AFM) and Fourier transform infrared spectroscopy (FTIR). For the film deposition, both patterned Si aand InP surfaces were used. It was found that the stronger interactions occur between C60 molecules and Si surface, than between C60 molecules and InP surface. On InP surface with microrelief of parallel V-grooves oriented in [011] direction, C60 films grow preferentially above the groove walls, with C60 grains arrayed in the direction perpendicular to the groove axis.

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