Molecular Arrangement in Langmuir and Langmuir−Blodgett Films of a Mesogenic Bent-Core Carboxylic Acid

Langmuir ◽  
2009 ◽  
Vol 25 (20) ◽  
pp. 12332-12339 ◽  
Author(s):  
Ignacio Giner ◽  
Ignacio Gascón ◽  
Jorge Vergara ◽  
M. Carmen López ◽  
M. Blanca Ros ◽  
...  
Keyword(s):  
Carboxylic Acid ◽  
Langmuir Blodgett ◽  
Molecular Arrangement ◽  
Langmuir Blodgett Films

scholarly journals Correction to Molecular Arrangement in Langmuir and Langmuir−Blodgett Films of a Mesogenic Bent-Core Carboxylic Acid

Langmuir ◽  
2009 ◽  
Vol 25 (23) ◽  
pp. 13696-13696
Author(s):  
Ignacio Giner ◽  
Ignacio Gascón ◽  
Jorge Vergara ◽  
M. Carmen López ◽  
M. Blanca Ros ◽  
...  
Keyword(s):  
Carboxylic Acid ◽  
Langmuir Blodgett ◽  
Molecular Arrangement ◽  
Langmuir Blodgett Films

Photolithography and Photochemical Reaction of Copolymer Containing Anthracene in Langmuir-Blodgett Films

2011 ◽  
Vol 418-420 ◽  
pp. 698-701
Author(s):  
Wen Jian Xu ◽  
Tie Sheng Li ◽  
Gong Zhao ◽  
Yang Jie Wu ◽  
Tokuji Miyashita
Keyword(s):  
Chemical Structure ◽  
Light Wavelength ◽  
Solid Supports ◽  
Lb Films ◽  
Langmuir Blodgett ◽  
Molecular Arrangement ◽  
Tone Pattern ◽  
Air Water Interface ◽  
Langmuir Blodgett Films ◽  
Negative Tone

A series of copolymer containing photoactive anthracene group, poly(N-dodecylmeth- acrylamide-co-anthrylmethylacrylate) p(DDMA-co-AnMA) were synthesized. Their molecular arrangement and photolithographic properties in Langmuir–Blodgett (LB) films were investigated. The copolymer p(DDMA-co-AnMA) could form stable monolayer at air/water interface and could be transferred onto solid supports, giving Y-type uniform LB films. The result showed that the irradiation with difference light wavelength leaded to changes of copolymer LB films in their chemical structure, concerning only the anthracence unit. When irradiated at 248 nm, the anthracene acted as photodecomposition group because of the peroxides. On the other hand, the main photoreaction induced by 365 nm is dimerization of anthracene. As a result, posotive-tone and negative-tone pattern could get by choosing a suittable irradiation light wavelength. Etching resistance of p(DDMA-AnMA) LB films was also investigated in a nanometer regime permitting etching of gold.

Molecular Arrangement Simulation of Pentacosadiynoic Acid Langmuir-Blodgett Films

1997 ◽  
Vol 36 (Part 1, No. 1A) ◽  
pp. 319-325 ◽  
Author(s):  
Hidetaka Higashino ◽  
Eriko Mizoguchi ◽  
Kazufumi Ogawa
Keyword(s):  
Langmuir Blodgett ◽  
Molecular Arrangement ◽  
Langmuir Blodgett Films

Molecular arrangement and polymerizability ofn-alkyl acrylates in langmuir-blodgett films

1992 ◽  
Vol 29 (1) ◽  
pp. 9-16 ◽  
Author(s):  
Toyoshi Shiozawa ◽  
Yoshio Shibasaki ◽  
Kiyoshige Fukuda
Keyword(s):  
Alkyl Acrylates ◽  
Langmuir Blodgett ◽  
Molecular Arrangement ◽  
Langmuir Blodgett Films
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