Physical Vapor Deposition of One-Dimensional Nanoparticle Arrays on Graphite:  Seeding the Electrodeposition of Gold Nanowires

Langmuir ◽  
2007 ◽  
Vol 23 (20) ◽  
pp. 10372-10379 ◽  
Author(s):  
C. E. Cross ◽  
J. C. Hemminger ◽  
R. M. Penner
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Gold Nanowires ◽  
Nanoparticle Arrays ◽  
One Dimensional

Combinatorial Studies for High Density Si and Ge Nanoparticle Arrays

2006 ◽  
Vol 933 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Vapor Deposition ◽  
Entire Range ◽  
Physical Vapor Deposition ◽  
Large Temperature ◽  
Nanoparticle Arrays ◽  
Nanoparticle Growth ◽  
Wide Range ◽  
Time Required ◽  
Nanoparticle Sizes ◽  
Deposition Conditions

ABSTRACTA simple combinatorial approach for studying chemical and physical vapor deposition (CVD and PVD) nanoparticle growth is presented utilizing temperature and precursor flux gradients across sample surfaces. Large temperature gradients (450-700 °C) are induced covering the entire range of interest for most CVD and PVD processes. Precursor flux gradients may also be introduced simultaneously or separately using a tungsten cracking filament mounted on a translation arm. Theory and calibration experiments are explained and results from a study on Ge nanoparticle growth on HfO2 surfaces are presented and analyzed. This method drastically decreases experimental time required to investigate nanoparticle growth and identify optimum deposition conditions. Furthermore, this approach greatly facilitates preparation of library samples containing a wide range (several orders of magnitude) in variation of nanoparticle sizes, density, and composition for subsequent studies.

Nanostructured Aluminum Films: Deep Ultraviolet Absorption from Glancing Angle Physical Vapor Deposition

2019 ◽  
Author(s):  
Stephen Stagon ◽  
Ryan Scherzer
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Nanoparticle Arrays ◽  
Aluminum Films ◽  
Optical Absorbance ◽  
Glancing Angle ◽  
Before And After ◽  
Facile Fabrication ◽  
Deep Ultraviolet

This entry reports on the facile fabrication and characterization of aluminum (Al) nanoparticle arrays that absorb strongly in deep ultraviolet. First, Al nanoparticle arrays are fabricated using glancing angle physical vapor deposition and have average diameters of ~30 nm. After subsequent annealing, the structures become oxidized on the exterior with an Al metal core. Ultraviolet visible spectroscopy is performed to characterize the optical absorbance of the structures before and after annealing. The as-fabricated structures show strong and broad absorption centered near ~230 nm, and annealing in air at 400°C results in tightening and blue shifting of the absorption peak. Additionally, annealing results in a decrease in overall absorption intensity. These new results may be potentially useful for tandem or plasmon-assisted photovoltaics.

Microstructures, Growth Mechanism of ZnS Nanomatrials Farbicated by Physical Vapor Deposition

2011 ◽  
Vol 356-360 ◽  
pp. 533-536
Author(s):  
Jiang Feng Gong ◽  
Chang Yong Lan ◽  
Bo Zhang ◽  
Wei Hua Zhu ◽  
Ming Yi Liu
Keyword(s):  
Vapor Deposition ◽  
Deposition Temperature ◽  
Physical Vapor Deposition ◽  
Deposition Method ◽  
Growth Mechanisms ◽  
Key Factors ◽  
Vapor Liquid Solid ◽  
One Dimensional ◽  
Physical Vapor Deposition Method ◽  
Temperature Area

In this paper, one-dimensional ZnS nanostructures were fabricated in a conventional tube furnace by physical vapor deposition method using commercial ZnS powder as the starting materials. The morphologies, microstructures of the products were characterized. The results revealed that the products showed different morphology in different deposition temperature area. The growth mechanisms of the products were also discussed. The nanowires and triangular nanosheets formed via a vapor-liquid-solid process, while the nanobelts formed via a vapor-solid process. The key factors which influenced the morphologies of the products were discussed.

TEM characterization of WSix films

1994 ◽  
Vol 52 ◽  
pp. 848-849
Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Vapor Deposition ◽  
High Purity ◽  
Physical Vapor Deposition ◽  
Thermal Treatments ◽  
Rapid Thermal Anneal ◽  
Tungsten Silicide ◽  
Tem Characterization ◽  
Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

scholarly journals Noble Metals for Modern Implant Materials: MOCVD of Film Structures and Cytotoxical, Antibacterial, and Histological Studies

Biomedicines ◽  
2021 ◽  
Vol 9 (8) ◽  
pp. 851
Author(s):  
Svetlana I. Dorovskikh ◽  
Evgeniia S. Vikulova ◽  
Elena V. Chepeleva ◽  
Maria B. Vasilieva ◽  
Dmitriy A. Nasimov ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Noble Metals ◽  
Mononuclear Cells ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Ti Alloy ◽  
Peripheral Blood Mononuclear ◽  
Histological Studies

This work is aimed at developing the modification of the surface of medical implants with film materials based on noble metals in order to improve their biological characteristics. Gas-phase transportation methods were proposed to obtain such materials. To determine the effect of the material of the bottom layer of heterometallic structures, Ir, Pt, and PtIr coatings with a thickness of 1.4–1.5 μm were deposited by metal–organic chemical vapor deposition (MOCVD) on Ti6Al4V alloy discs. Two types of antibacterial components, namely, gold nanoparticles (AuNPs) and discontinuous Ag coatings, were deposited on the surface of these coatings. AuNPs (11–14 nm) were deposited by a pulsed MOCVD method, while Ag films (35–40 nm in thickness) were obtained by physical vapor deposition (PVD). The cytotoxic (24 h and 48 h, toward peripheral blood mononuclear cells (PBMCs)) and antibacterial (24 h) properties of monophase (Ag, Ir, Pt, and PtIr) and heterophase (Ag/Pt, Ag/Ir, Ag/PtIr, Au/Pt, Au/Ir, and Au/PtIr) film materials deposited on Ti-alloy samples were studied in vitro and compared with those of uncoated Ti-alloy samples. Studies of the cytokine production by PBMCs in response to incubation of the samples for 24 and 48 h and histological studies at 1 and 3 months after subcutaneous implantation in rats were also performed. Despite the comparable thickness of the fibrous capsule after 3 months, a faster completion of the active phase of encapsulation was observed for the coated implants compared to the Ti alloy analogs. For the Ag-containing samples, growth inhibition of S. epidermidis, S. aureus, Str. pyogenes, P. aeruginosa, and Ent. faecium was observed.

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