Surface Modification of Nanoclays by Catalytically Active Transition Metal Ions

Langmuir ◽  
2007 ◽  
Vol 23 (19) ◽  
pp. 9808-9815 ◽  
Author(s):  
Pranav Nawani ◽  
Mikhail Y. Gelfer ◽  
Benjamin S. Hsiao ◽  
Anatoly Frenkel ◽  
Jeffrey W. Gilman ◽  
...  
Keyword(s):  
Surface Modification ◽  
Transition Metal ◽  
Metal Ions ◽  
Transition Metal Ions ◽  
Catalytically Active ◽  
Active Transition

Surface modification of nonporous glass beads with chitosan and their adsorption property for transition metal ions

2002 ◽  
Vol 49 (2) ◽  
pp. 103-108 ◽  
Author(s):  
Xiang Dong Liu ◽  
Seiichi Tokura ◽  
Masahiro Haruki ◽  
Norio Nishi ◽  
Nobuo Sakairi
Keyword(s):  
Surface Modification ◽  
Transition Metal ◽  
Metal Ions ◽  
Adsorption Property ◽  
Transition Metal Ions ◽  
Glass Beads

Low-density lipoprotein modification by normal, myeloperoxidase-deficient and NADPH oxidase-deficient granulocytes and the impact of redox active transition metal ions

Redox Report ◽  
2002 ◽  
Vol 7 (2) ◽  
pp. 111-119 ◽  
Author(s):  
Claudia E. Gerber ◽  
Gernot Bruchelt ◽  
Gerhard Ledinski ◽  
Joachim Greilberger ◽  
Dietrich Niethammer ◽  
...  
Keyword(s):  
Transition Metal ◽  
Nadph Oxidase ◽  
Metal Ions ◽  
Low Density Lipoprotein ◽  
Density Lipoprotein ◽  
Transition Metal Ions ◽  
Low Density ◽  
Redox Active ◽  
Active Transition ◽  
The Impact

Structural snapshots of the rearrangement of the bis(di-tert-butyl-aminophenyl)amine pincer ligand in the presence of transition metal ions

2018 ◽  
Vol 47 (33) ◽  
pp. 11303-11307 ◽  
Author(s):  
N. Leconte ◽  
B. Baptiste ◽  
C. Philouze ◽  
F. Thomas
Keyword(s):  
Transition Metal ◽  
Metal Ions ◽  
Transition Metal Ions ◽  
Pincer Ligand ◽  
Tert Butyl ◽  
Redox Active ◽  
Active Transition

The ligand undergoes N–N and C–N bond formations in the presence of redox-active transition metal ions, in air and coordinating solvents.

Could Hydrogen Peroxide Photolysis Occur in the Absence of Transition Metals ?

1981 ◽  
Vol 36 (5) ◽  
pp. 654-655 ◽  
Author(s):  
Stanislav Luňák ◽  
Josef Vepřek-Šiška
Keyword(s):  
Hydrogen Peroxide ◽  
Transition Metal ◽  
Reaction System ◽  
Transition Metal Ions ◽  
Quantum Yields ◽  
Complexing Agents ◽  
Square Root ◽  
Catalytically Active ◽  
Active Transition ◽  
Trace Concentrations

Quantum yields of hydrogen peroxide photolysis increase with the square root of concentration of added Cu(II). The cupric ions are photo-catalytically active already at trace concentrations (10-7), i.e., at the concentrations present in any real reaction system. Hydrogen peroxide photolysis is completely suppressed on addition of complexing agents such as EDTA. It is believed that no hydrogen peroxide photolysis would occur in complete absence of photo-catalytically active transition metal ions

HREM Study of electron-induced surface radiation damage in ReO3

1991 ◽  
Vol 49 ◽  
pp. 636-637
Author(s):  
R. Ai ◽  
H.-J. Fan ◽  
L. D. Marks
Keyword(s):  
Transition Metal ◽  
Metal Ions ◽  
Metal Oxides ◽  
Electron Irradiation ◽  
Transition Metal Oxides ◽  
Carbon Film ◽  
Transition Metal Ions ◽  
Surface Radiation ◽  
Valence Transition ◽  
Electron Microscopes

It has been known for a long time that electron irradiation induces damage in maximal valence transition metal oxides such as TiO2, V2O5, and WO3, of which transition metal ions have an empty d-shell. This type of damage is excited by electronic transition and can be explained by the Knoteck-Feibelman mechanism (K-F mechanism). Although the K-F mechanism predicts that no damage should occur in transition metal oxides of which the transition metal ions have a partially filled d-shell, namely submaximal valence transition metal oxides, our recent study on ReO3 shows that submaximal valence transition metal oxides undergo damage during electron irradiation.ReO3 has a nearly cubic structure and contains a single unit in its cell: a = 3.73 Å, and α = 89°34'. TEM specimens were prepared by depositing dry powders onto a holey carbon film supported on a copper grid. Specimens were examined in Hitachi H-9000 and UHV H-9000 electron microscopes both operated at 300 keV accelerating voltage. The electron beam flux was maintained at about 10 A/cm2 during the observation.

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