Electrochromic Properties of a Metallo-supramolecular Polymer Derived from Tetra(2-pyridyl-1,4-pyrazine) Ligands Integrated in Thin Multilayer Films

Langmuir ◽  
2012 ◽  
Vol 28 (6) ◽  
pp. 3332-3337 ◽  
Author(s):  
Clóvis A. da Silva ◽  
Marcio Vidotti ◽  
Pablo A. Fiorito ◽  
Susana I. Córdoba de Torresi ◽  
Roberto M. Torresi ◽  
...  
Keyword(s):  
Multilayer Films ◽  
Supramolecular Polymer ◽  
Electrochromic Properties

Electrochromic properties of self-assembled nanoparticle multilayer films

2010 ◽  
Vol 518 (21) ◽  
pp. 6107-6112 ◽  
Author(s):  
Bo Xue ◽  
Hong Li ◽  
Lanlan Zhang ◽  
Jun Peng
Keyword(s):  
Multilayer Films ◽  
Electrochromic Properties ◽  
Self Assembled

Effects of film structure on electrochromic properties of the multilayer films containing polyoxometalates

2009 ◽  
Vol 330 (2) ◽  
pp. 408-414 ◽  
Author(s):  
Bingbing Xu ◽  
Lin Xu ◽  
Guanggang Gao ◽  
Weihua Guo ◽  
Shuping Liu
Keyword(s):  
Multilayer Films ◽  
Film Structure ◽  
Electrochromic Properties

Fabrication and characterization - by High Resolution Electron Microscopy and atom probe microanalysis - of Co-based metallic multilayer films

1990 ◽  
Vol 48 (4) ◽  
pp. 772-773
Author(s):  
Amanda K. Petford-Long ◽  
A. Cerezo ◽  
M.G. Hetherington
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Atom Probe ◽  
Multilayer Films ◽  
Interface Roughness ◽  
Probe Field ◽  
Resolution Electron ◽  
Potential Applications ◽  
Field Ion Microscope

The fabrication of multilayer films (MLF) with layer thicknesses down to one monolayer has led to the development of materials with unique properties not found in bulk materials. The properties of interest depend critically on the structure and composition of the films, with the interfacial regions between the layers being of particular importance. There are a number of magnetic MLF systems based on Co, several of which have potential applications as perpendicular magnetic (e.g Co/Cr) or magneto-optic (e.g. Co/Pt) recording media. Of particular concern are the effects of parameters such as crystallographic texture and interface roughness, which are determined by the fabrication conditions, on magnetic properties and structure.In this study we have fabricated Co-based MLF by UHV thermal evaporation in the prechamber of an atom probe field-ion microscope (AP). The multilayers were deposited simultaneously onto cobalt field-ion specimens (for AP and position-sensitive atom probe (POSAP) microanalysis without exposure to atmosphere) and onto the flat (001) surface of oxidised silicon wafers (for subsequent study in cross-section using high-resolution electron microscopy (HREM) in a JEOL 4000EX. Deposi-tion was from W filaments loaded with material in the form of wire (Co, Fe, Ni, Pt and Au) or flakes (Cr). The base pressure in the chamber was around 8×10−8 torr during deposition with a typical deposition rate of 0.05 - 0.2nm/s.

Electrostatic Adhesion Testing for the Evaluation of Metallization Adhesion

1997 ◽  
Vol 473 ◽  
Author(s):  
H. S. Yang ◽  
F. R. Brotzen ◽  
D. L. Callahan ◽  
C. F. Dunn
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Distribution Function ◽  
Quantitative Measurement ◽  
Multilayer Films ◽  
Adhesion Testing ◽  
Novel Technique ◽  
Electrostatic Adhesion ◽  
Scanning Electron

ABSTRACTQuantitative measurement of the adhesion strength of thin film metallizations has been achieved by a novel technique employing electrostatic forces to generate delaminating stresses. This technique has been used in testing the adhesion of Al-Cu, Cu, and Al multilayer films deposited on Si. Micro-blister-type failure is revealed by scanning electron microscopy. The delamination process and the geometry of the blister are discussed. The measured adhesion data fit a Weibull distribution function.

Sign in / Sign up

Export Citation Format

Share Document