Thermal and Mechanical Aging of Self-Assembled Monolayers as Studied by Near Edge X-ray Absorption Fine Structure

Langmuir ◽  
2011 ◽  
Vol 27 (20) ◽  
pp. 12423-12433 ◽  
Author(s):  
Robert J. Klein ◽  
Daniel A. Fischer ◽  
Joseph L. Lenhart
1994 ◽  
Vol 01 (04) ◽  
pp. 701-704 ◽  
Author(s):  
H. RIELEY ◽  
N.J. PRICE ◽  
R.G. WHITE ◽  
R.I.R. BLYTH ◽  
L. HÅKANSSON ◽  
...  

S K-edge near-edge X-ray absorption fine structure (NEXAFS) has been used to establish the oxidation state of S in self-assembled monolayers (SAMs) of heptane and octane thiols, RSH [ R=CH 3( CH 2)n, n=6, 7] and the analogous halo-alkane disulphides, [(X RS )2, X= Cl , Br ] derivatised ex situ on Au foil. We find that the initially prepared surface thiolate species (RS–) is photo-oxidised by X-radiation, in the presence of coadsorbed oxygen, to sulphonate [Formula: see text]. Angle-resolved UV photoemission (ARUPS) has been used to further characterise the nature of the S-Au interaction in these SAMs following their preparation in UHV on Au(111). The ARUPS results suggest the involvement of the Au d-bands in the S-Au bond.


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