Site-Selective Surface Modification Using Enzymatic Soft Lithography

Langmuir ◽  
2011 ◽  
Vol 27 (12) ◽  
pp. 7629-7634 ◽  
Author(s):  
Aurélie Guyomard-Lack ◽  
Nicolas Delorme ◽  
Céline Moreau ◽  
Jean-François Bardeau ◽  
Bernard Cathala
Keyword(s):  
Surface Modification ◽  
Soft Lithography ◽  
Site Selective ◽  
Selective Surface Modification

Area Selective Atomic Layer Deposition by Soft Lithography

2006 ◽  
Vol 917 ◽  
Author(s):  
Rong Chen ◽  
David W. Porter ◽  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Stacey F. Bent
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Soft Lithography ◽  
Film Growth ◽  
Atomic Layer ◽  
Hydroxyl Groups ◽  
Contact Printing ◽  
Si Substrates ◽  
Layer Deposition ◽  
Selective Surface Modification

AbstractArea selective HfO2 thin film growth through atomic layer deposition (ALD) has been achieved on octadecyltrichlorosilane (ODTS) patterned Si substrates. Patterned hydrophobic self-assembled monolayers (SAMs) were first transferred to Si substrates by micro-contact printing. Using hafnium-tetrachloride or tetrakis(dimethylamido) hafnium(IV) and water as ALD precursors, amorphous HfO2 layers were then grown selectively on the SAM-free regions of the surface where native hydroxyl groups nucleate growth from the vapor phase. The HfO2 pattern was readily observed through scanning electron microscopy and scanning Auger imaging, demonstrating that soft lithography is a simple and promising method to achieve area selective ALD. To evaluate the selectivity, the resolution of the soft lithography based method was compared with that of area selective ALD of HfO2 by selective surface modification of patterned silicon oxide obtained using long-time SAM exposure. It was found that the selective surface modification showed much higher spatial resolution and selectivity, an observation consistent with previous studies indicating that highly ordered and densely packed ODTS films were important to achieve complete deactivation.

Direct Patterning of Copper on Polyimide by Site-Selective Surface Modification via a Screen-Printing Process

ChemPhysChem ◽  
2011 ◽  
Vol 12 (6) ◽  
pp. 1143-1147 ◽  
Author(s):  
Wei Su ◽  
Peiyuan Li ◽  
Libei Yao ◽  
Fang Yang ◽  
Lifang Liang ◽  
...  
Keyword(s):  
Surface Modification ◽  
Screen Printing ◽  
Printing Process ◽  
Direct Patterning ◽  
Site Selective ◽  
Selective Surface Modification

Site-Selective Surface Modification of 2D Superatomic Re6Se8

2022 ◽  
Author(s):  
Shoushou He ◽  
Austin M. Evans ◽  
Elena Meirzadeh ◽  
Sae Young Han ◽  
Jake C. Russell ◽  
...  
Keyword(s):  
Surface Modification ◽  
Site Selective ◽  
Selective Surface Modification

scholarly journals Micro and nanopatterning of functional materials on flexible plastic substrates via site-selective surface modification using oxygen plasma

2012 ◽  
Vol 22 (2) ◽  
pp. 328-332 ◽  
Author(s):  
Antony George ◽  
Tomasz M. Stawski ◽  
Sandeep Unnikrishnan ◽  
Sjoerd A. Veldhuis ◽  
Johan E. ten Elshof
Keyword(s):  
Surface Modification ◽  
Oxygen Plasma ◽  
Functional Materials ◽  
Plastic Substrates ◽  
Site Selective ◽  
Selective Surface Modification

scholarly journals Selective surface modification in bimodal mesoporous CMK-5 carbon

2016 ◽  
Vol 4 (47) ◽  
pp. 18426-18431 ◽  
Author(s):  
C. Weinberger ◽  
X. Cao ◽  
M. Tiemann
Keyword(s):  
Surface Modification ◽  
Mesoporous Carbon ◽  
Selective Surface Modification

Ordered, bimodal mesoporous carbon with distinct pore modes of different hydrophobicity is prepared by selective surface modification.

Selective surface modification of PET substrate for inkjet printing

2014 ◽  
Vol 71 (9-12) ◽  
pp. 1749-1755 ◽  
Author(s):  
L. P. Yeo ◽  
B. K. Lok ◽  
Q. M. P. Nguyen ◽  
C. W. Lu ◽  
Y. C. Lam
Keyword(s):  
Surface Modification ◽  
Inkjet Printing ◽  
Selective Surface Modification ◽  
Pet Substrate
Sign in / Sign up

Export Citation Format

Share Document