Growth Kinetics and Morphology of Self-Assembled Monolayers Formed by Contact Printing 7-Octenyltrichlorosilane and Octadecyltrichlorosilane on Si(100) Wafers

Langmuir ◽  
2004 ◽  
Vol 20 (25) ◽  
pp. 10878-10888 ◽  
Author(s):  
Yoshiko Harada ◽  
Gregory S. Girolami ◽  
Ralph G. Nuzzo
Keyword(s):  
Growth Kinetics ◽  
Self Assembled Monolayers ◽  
Contact Printing ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Localized dealloying corrosion mediated by self-assembled monolayers used as an inhibitor system

2015 ◽  
Vol 180 ◽  
pp. 191-204 ◽  
Author(s):  
B. R. Shrestha ◽  
A. Bashir ◽  
G. N. Ankah ◽  
M. Valtiner ◽  
F. U. Renner
Keyword(s):  
Microscopy Study ◽  
Structural Defects ◽  
Self Assembled Monolayers ◽  
Contact Printing ◽  
Local Composition ◽  
Force Microscopy ◽  
Assembled Monolayers ◽  
Inhibitor System ◽  
Self Assembled

The structure and chemistry of thiol or selenol self-assembled organic monolayers have been frequently addressed due to the unique opportunities in functionalization of materials. Such organic films can also act as effective inhibition layers to mitigate oxidation or corrosion. Cu–Au alloy substrates covered by self-assembled monolayers show a different dealloying mechanism compared to bare surfaces. The organic surface layer inhibits dealloying of noble metal alloys by a suppression of surface diffusion at lower potentials but at higher applied potentials dealloying proceeds in localized regions due to passivity breakdown. We present an in situ atomic force microscopy study of a patterned thiol layer applied on Cu–Au alloy surfaces and further explore approaches to change the local composition of the surface layers by exchange of molecules. The pattern for the in situ experiment has been applied by micro-contact printing. This allows the study of corrosion protection with its dependence on different molecule densities at different sites. Low-density thiol areas surrounding the high-density patterns are completely protected and initiation of dealloying proceeds only along the areas with the lowest inhibitor concentration. Dealloying patterns are highly influenced and controlled by molecular thiol to selenol exchange and are also affected by introducing structural defects such as scratches or polishing defects.

Electrochemical behavior of self-assembled monolayers based on functionalized oligothiophenes

1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier
Keyword(s):  
Electrochemical Behavior ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Imaging of patterned self-assembled monolayers by scanning photoelectron microscopy

2003 ◽  
Vol 104 ◽  
pp. 459-462 ◽  
Author(s):  
R. Klauser ◽  
M. Zharnikov ◽  
I.-H. Hong ◽  
S.-C. Wang ◽  
A. Gölzhäuser ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Scanning Photoelectron Microscopy ◽  
Self Assembled

Self-assembled Monolayers Preparation and Characterization of BiFeO3 Thin Films

2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE
Keyword(s):  
Thin Films ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled
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