Kinetics of localized adsorption of colloid particles

Langmuir ◽  
1992 ◽  
Vol 8 (11) ◽  
pp. 2605-2610 ◽  
Author(s):  
Z. Adamczyk ◽  
B. Siwek ◽  
M. Zembala ◽  
P. Weronski
Keyword(s):  
Colloid Particles ◽  
Localized Adsorption ◽  
Kinetics Of

Kinetics of localized adsorption of colloid particles

1994 ◽  
Vol 48 ◽  
pp. 151-280 ◽  
Author(s):  
Zbigniew Adamczyk ◽  
Barbara Siwek ◽  
Maria Zembala ◽  
Peter Belouschek
Keyword(s):  
Colloid Particles ◽  
Localized Adsorption ◽  
Kinetics Of

Adhesion of Fine Particles at Solid/Solution Interfaces

MRS Bulletin ◽  
1990 ◽  
Vol 15 (1) ◽  
pp. 41-47 ◽  
Author(s):  
Nikola Kallay
Keyword(s):  
Fine Particles ◽  
Plane Surface ◽  
Solid Surfaces ◽  
Liquid Media ◽  
Latex Dispersions ◽  
Colloid Particles ◽  
The Subject ◽  
Kinetic Investigations ◽  
The Stability ◽  
Kinetics Of

The adhesion of particles at solid surfaces in liquid media has attracted the attention of scientists because of its various applications as well as the theoretical significance of the processes involved. Early studies were characterized either by poorly defined systems or limited by the properties of a few morphologically well-defined model colloids, such as latex dispersions. Consequently, results were either of semiquantitative nature or were related to some specific cases, which eluded general conclusions. New methods for preparing uniform particles of different compositions, shapes, and sizes make it possible to approach the problem in a more comprehensive manner. For example, to demonstrate difficulties caused by polydispersity, it is sufficient to mention that the electrostatic interaction energy between a plane surface and a particle is approximately proportional to the particle radius, yet the rate of deposition depends exponentially on the height of the energy barrier.In principle, static and dynamic approaches may be employed in the study of particle adhesion. The static method yields the force required to detach an adhered particle, while kinetic investigations of attachment and detachment give the rates of the respective processes. Both methods offer information on the stability of the system in terms of the bond strength of adhered solids. For small colloid particles, which are the subject of thermal random Brownian motion, the dynamic approach is more appropriate. This article emphasizes the kinetics of deposition and detachment of small colloid particles in liquid media.

Kinetics of localized adsorption of particles on homogeneous surfaces

1992 ◽  
Vol 151 (2) ◽  
pp. 351-369 ◽  
Author(s):  
Z Adamczyk ◽  
B Siwek ◽  
M Zembala
Keyword(s):  
Localized Adsorption ◽  
Kinetics Of

Direct observations of radiation-enhanced transformations in glass

1983 ◽  
Vol 41 ◽  
pp. 354-355
Author(s):  
J. F. DeNatale ◽  
D. G. Howitt
Keyword(s):  
Glass Matrix ◽  
Diffusion Mechanism ◽  
Bubble Formation ◽  
Silicate Glasses ◽  
Phase Decomposition ◽  
Direct Observations ◽  
Thin Foils ◽  
Oxygen Bubble ◽  
Electron Energy Loss ◽  
Kinetics Of

The electron irradiation of silicate glasses containing metal cations produces various types of phase separation and decomposition which includes oxygen bubble formation at intermediate temperatures figure I. The kinetics of bubble formation are too rapid to be accounted for by oxygen diffusion but the behavior is consistent with a cation diffusion mechanism if the amount of oxygen in the bubble is not significantly different from that in the same volume of silicate glass. The formation of oxygen bubbles is often accompanied by precipitation of crystalline phases and/or amorphous phase decomposition in the regions between the bubbles and the detection of differences in oxygen concentration between the bubble and matrix by electron energy loss spectroscopy cannot be discerned (figure 2) even when the bubble occupies the majority of the foil depth.The oxygen bubbles are stable, even in the thin foils, months after irradiation and if van der Waals behavior of the interior gas is assumed an oxygen pressure of about 4000 atmospheres must be sustained for a 100 bubble if the surface tension with the glass matrix is to balance against it at intermediate temperatures.

Irradiation behavior of pyrolytic silicon carbide

1983 ◽  
Vol 41 ◽  
pp. 72-73
Author(s):  
R. J. Lauf
Keyword(s):  
Silicon Carbide ◽  
Fission Products ◽  
Thermodynamics And Kinetics ◽  
Neutron Fluences ◽  
Fuel Particles ◽  
Sic Coatings ◽  
Irradiation Behavior ◽  
Kinetics Of ◽  
Htgr Fuel

Fuel particles for the High-Temperature Gas-Cooled Reactor (HTGR) contain a layer of pyrolytic silicon carbide to act as a miniature pressure vessel and primary fission product barrier. Optimization of the SiC with respect to fuel performance involves four areas of study: (a) characterization of as-deposited SiC coatings; (b) thermodynamics and kinetics of chemical reactions between SiC and fission products; (c) irradiation behavior of SiC in the absence of fission products; and (d) combined effects of irradiation and fission products. This paper reports the behavior of SiC deposited on inert microspheres and irradiated to fast neutron fluences typical of HTGR fuel at end-of-life.

The Ordered Phase Formation in Ti-Al-Ga Alloys

1970 ◽  
Vol 28 ◽  
pp. 440-441
Author(s):  
Shiro Fujishiro ◽  
Harold L. Gegel
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Titanium Alloys ◽  
Growth Kinetics ◽  
Stoichiometric Composition ◽  
Good Potential ◽  
Alpha Titanium ◽  
Cold Rolled ◽  
Kinetics Of ◽  
Thermal Stability Of

Ordered-alpha titanium alloys having a DO19 type structure have good potential for high temperature (600°C) applications, due to the thermal stability of the ordered phase and the inherent resistance to recrystallization of these alloys. Five different Ti-Al-Ga alloys consisting of equal atomic percents of aluminum and gallium solute additions up to the stoichiometric composition, Ti3(Al, Ga), were used to study the growth kinetics of the ordered phase and the nature of its interface.The alloys were homogenized in the beta region in a vacuum of about 5×10-7 torr, furnace cooled; reheated in air to 50°C below the alpha transus for hot working. The alloys were subsequently acid cleaned, annealed in vacuo, and cold rolled to about. 050 inch prior to additional homogenization

Ion Beam Induced Interfacial Reactions in Molybdenum Thin Films on Silicon

1981 ◽  
Vol 39 ◽  
pp. 162-163
Author(s):  
L. J. Chen ◽  
L. S. Hung ◽  
J. W. Mayer
Keyword(s):  
Ion Beam ◽  
Chemical Vapor ◽  
Interfacial Reactions ◽  
Practical Applications ◽  
Microelectronic Devices ◽  
Recent Emergence ◽  
Chemical Vapor Deposited ◽  
Atomic Mixing ◽  
Silicon Interface ◽  
Kinetics Of

When an energetic ion penetrates through an interface between a thin film (of species A) and a substrate (of species B), ion induced atomic mixing may result in an intermixed region (which contains A and B) near the interface. Most ion beam mixing experiments have been directed toward metal-silicon systems, silicide phases are generally obtained, and they are the same as those formed by thermal treatment.Recent emergence of silicide compound as contact material in silicon microelectronic devices is mainly due to the superiority of the silicide-silicon interface in terms of uniformity and thermal stability. It is of great interest to understand the kinetics of the interfacial reactions to provide insights into the nature of ion beam-solid interactions as well as to explore its practical applications in device technology.About 500 Å thick molybdenum was chemical vapor deposited in hydrogen ambient on (001) n-type silicon wafer with substrate temperature maintained at 650-700°C. Samples were supplied by D. M. Brown of General Electric Research & Development Laboratory, Schenectady, NY.

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