Femtosecond Laser Ablation of Liquid Toluene: Molecular Mechanism Studied by Time-Resolved Absorption Spectroscopy

1999 ◽  
Vol 103 (51) ◽  
pp. 11257-11263 ◽  
Author(s):  
Koji Hatanaka ◽  
Tamitake Itoh ◽  
Tsuyoshi Asahi ◽  
Nobuyuki Ichinose ◽  
Shunichi Kawanishi ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Molecular Mechanism ◽  
Absorption Spectroscopy ◽  
Femtosecond Laser Ablation ◽  
Time Resolved

Time-resolved electron imaging of femtosecond laser ablation

2005 ◽  
pp. 825-827
Author(s):  
Yasuaki Okano ◽  
Yoichiro Hironaka ◽  
Ken-ichi Kondo ◽  
Kazutaka G. Nakamura
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Femtosecond Laser Ablation ◽  
Time Resolved ◽  
Electron Imaging

Application of time-resolved digital holographic microscopy in studies of early femtosecond laser ablation

2012 ◽  
Vol 108 (2) ◽  
pp. 343-349 ◽  
Author(s):  
Aivaras Urniežius ◽  
Nerijus Šiaulys ◽  
Viačeslav Kudriašov ◽  
Valdas Sirutkaitis ◽  
Andrius Melninkaitis
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Femtosecond Laser Ablation ◽  
Digital Holographic Microscopy ◽  
Time Resolved ◽  
Holographic Microscopy

Time resolved detection of particle removal from dielectrics on femtosecond laser ablation

1998 ◽  
Vol 127-129 ◽  
pp. 76-80 ◽  
Author(s):  
A Rosenfeld ◽  
D Ashkenasi ◽  
H Varel ◽  
M Wähmer ◽  
E.E.B Campbell
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Femtosecond Laser Ablation ◽  
Particle Removal ◽  
Time Resolved

scholarly journals Experimental verification of femtosecond laser ablation schemes by time-resolved soft x-ray reflective imaging

2012 ◽  
Vol 20 (28) ◽  
pp. 29329 ◽  
Author(s):  
Takuro Tomita ◽  
Minoru Yamamoto ◽  
Noboru Hasegawa ◽  
Kota Terakawa ◽  
Yasuo Minami ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Experimental Verification ◽  
Femtosecond Laser Ablation ◽  
Time Resolved ◽  
X Ray

scholarly journals Generation and evolution of plasma during femtosecond laser ablation of silicon in different ambient gases

2013 ◽  
Vol 31 (3) ◽  
pp. 539-545 ◽  
Author(s):  
Zhandong Chen ◽  
Qiang Wu ◽  
Ming Yang ◽  
Baiquan Tang ◽  
Jianghong Yao ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Emission Spectra ◽  
Femtosecond Laser Ablation ◽  
Coulomb Repulsion ◽  
Time Resolved ◽  
Monovalent Ions ◽  
Ambient Gases ◽  
Ambient Gas ◽  
Deposition Effect

AbstractGeneration and evolution of plasma during femtosecond laser ablation of silicon are studied by steady-state and time-resolved spectroscopy in air, N2, SF6, and under vacuum. The plasma is generated faster than 200 ps (time resolution of our experiment) after excitation and mainly contains atoms and monovalent ions of silicon. Time-resolved spectra prove that silicon ions are faster than the silicon atoms which may be attributed to Coulomb repulsion and a local electric field when they are ejected from the silicon surface. During plasma evolution, ambient gas causes a confinement effect that enhances the dissociation of ambient gas molecules and the re-deposition of the removed material and leads to higher intensity and longer lifetime of the emission spectra. In SF6, a chemical reaction increases the plasma density and weakens the re-deposition effect. The different processes during plasma evolution strongly influence microstructure formation.

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