Comparison of Electron-Transfer Dynamics from Coumarin 343 to TiO2, SnO2, and ZnO Nanocrystalline Thin Films: Role of Interface-Bound Charge-Separated Pairs

2010 ◽  
Vol 114 (14) ◽  
pp. 6560-6566 ◽  
Author(s):  
David Stockwell ◽  
Ye Yang ◽  
Jier Huang ◽  
Chantelle Anfuso ◽  
Zhuangqun Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Transfer ◽  
Nanocrystalline Thin Films ◽  
Coumarin 343

Mono-textured nanocrystalline thin films with pronounced stress-gradients: On the role of grain boundaries in the stress evolution

2014 ◽  
Vol 115 (20) ◽  
pp. 203507 ◽  
Author(s):  
R. Daniel ◽  
E. Jäger ◽  
J. Todt ◽  
B. Sartory ◽  
C. Mitterer ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Boundaries ◽  
Stress Evolution ◽  
Stress Gradients ◽  
Nanocrystalline Thin Films

scholarly journals pH-Dependent Electron Transfer from Re-bipyridyl Complexes to Metal Oxide Nanocrystalline Thin Films

2005 ◽  
Vol 109 (41) ◽  
pp. 19345-19355 ◽  
Author(s):  
Chunxing She ◽  
Neil A. Anderson ◽  
Jianchang Guo ◽  
Fang Liu ◽  
Wan-Hee Goh ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Transfer ◽  
Metal Oxide ◽  
Ph Dependent ◽  
Nanocrystalline Thin Films

Ultrafast Electron Transfer Dynamics from Molecular Adsorbates to Semiconductor Nanocrystalline Thin Films

2001 ◽  
Vol 105 (20) ◽  
pp. 4545-4557 ◽  
Author(s):  
John B. Asbury ◽  
Encai Hao ◽  
Yongqiang Wang ◽  
Hirendra N. Ghosh ◽  
Tianquan Lian
Keyword(s):  
Thin Films ◽  
Electron Transfer ◽  
Molecular Adsorbates ◽  
Nanocrystalline Thin Films ◽  
Ultrafast Electron Transfer

Bridge-Dependent Interfacial Electron Transfer from Rhenium−Bipyridine Complexes to TiO2 Nanocrystalline Thin Films

2010 ◽  
Vol 114 (21) ◽  
pp. 9898-9907 ◽  
Author(s):  
Peerasak Paoprasert ◽  
Jennifer E. Laaser ◽  
Wei Xiong ◽  
Ryan A. Franking ◽  
Robert J. Hamers ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Transfer ◽  
Interfacial Electron Transfer ◽  
Nanocrystalline Thin Films

The study of interfacial reactions of nickel thin films on GaAs

1983 ◽  
Vol 41 ◽  
pp. 156-157
Author(s):  
L.J. Chen ◽  
Y.F. Hsieh
Keyword(s):  
Thin Films ◽  
Integrated Circuits ◽  
Interfacial Reactions ◽  
Metal Contacts ◽  
Nickel Thin Films ◽  
Thin Foils ◽  
The Status ◽  
Si Doped ◽  
Electron Microscopes

One measure of the maturity of a device technology is the ease and reliability of applying contact metallurgy. Compared to metal contact of silicon, the status of GaAs metallization is still at its primitive stage. With the advent of GaAs MESFET and integrated circuits, very stringent requirements were placed on their metal contacts. During the past few years, extensive researches have been conducted in the area of Au-Ge-Ni in order to lower contact resistances and improve uniformity. In this paper, we report the results of TEM study of interfacial reactions between Ni and GaAs as part of the attempt to understand the role of nickel in Au-Ge-Ni contact of GaAs.N-type, Si-doped, (001) oriented GaAs wafers, 15 mil in thickness, were grown by gradient-freeze method. Nickel thin films, 300Å in thickness, were e-gun deposited on GaAs wafers. The samples were then annealed in dry N2 in a 3-zone diffusion furnace at temperatures 200°C - 600°C for 5-180 minutes. Thin foils for TEM examinations were prepared by chemical polishing from the GaA.s side. TEM investigations were performed with JE0L- 100B and JE0L-200CX electron microscopes.

Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk

1991 ◽  
Vol 49 ◽  
pp. 580-581
Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Magnetic Recording ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Substrate Bias ◽  
Epitaxial Relationship ◽  
Transmission Electron

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

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