Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

2008 ◽  
Vol 112 (40) ◽  
pp. 15791-15795 ◽  
Author(s):  
Elina Färm ◽  
Marianna Kemell ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Atomic Layer Deposition ◽  
Methyl Methacrylate ◽  
Atomic Layer ◽  
Poly Methyl Methacrylate ◽  
Selective Area ◽  
Layer Deposition

scholarly journals Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

Polymers ◽  
2021 ◽  
Vol 13 (8) ◽  
pp. 1346
Author(s):  
Marta Adriana Forte ◽  
Ricardo Manuel Silva ◽  
Carlos José Tavares ◽  
Rui Ferreira e Silva
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Methyl Methacrylate ◽  
Flexible Electronics ◽  
Surface Engineering ◽  
Chemical Deposition ◽  
Atomic Layer ◽  
Level Control ◽  
Poly Methyl Methacrylate ◽  
Layer Deposition

Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing.

Microcontact Printed RuOx Film as an Activation Layer for Selective-Area Atomic Layer Deposition of Ruthenium

2012 ◽  
Vol 24 (2) ◽  
pp. 275-278 ◽  
Author(s):  
Elina Färm ◽  
Seppo Lindroos ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Selective Area ◽  
Layer Deposition

scholarly journals Selective-Area, Water-Free Atomic Layer Deposition of Metal Oxides on Graphene Defects

2021 ◽  
Author(s):  
Michael F. Mazza ◽  
Miguel Cabán-Acevedo ◽  
Harold J. Fu ◽  
Madeline C. Meier ◽  
Annelise C. Thompson ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Atomic Layer ◽  
Selective Area ◽  
Layer Deposition

Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition—Defectivity Reduction by Monolayer Design

2018 ◽  
Vol 10 (44) ◽  
pp. 38630-38637 ◽  
Author(s):  
Rudy Wojtecki ◽  
Magi Mettry ◽  
Noah F. Fine Nathel ◽  
Alexander Friz ◽  
Anuja De Silva ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Selective Area ◽  
Layer Deposition
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