Oxidation of a Tb2O3(111) Thin Film on Pt(111) by Gas-Phase Oxygen Atoms

2014 ◽  
Vol 118 (36) ◽  
pp. 20916-20926 ◽  
Author(s):  
William Cartas ◽  
Rahul Rai ◽  
Ajinkya Sathe ◽  
Andreas Schaefer ◽  
Jason F. Weaver
Keyword(s):  
Thin Film ◽  
Gas Phase ◽  
Oxygen Atoms

Reactivity of amino acid anions with nitrogen and oxygen atoms

2018 ◽  
Vol 20 (7) ◽  
pp. 4990-4996 ◽  
Author(s):  
Zhe-Chen Wang ◽  
Ya-Ke Li ◽  
Sheng-Gui He ◽  
Veronica M. Bierbaum
Keyword(s):  
Amino Acid ◽  
Gas Phase ◽  
Ground State ◽  
Phase Reaction ◽  
Gas Phase Reaction ◽  
Oxygen Atoms

Gas-phase reaction of deprotonated tyrosine with a ground state O atom generates five ionic products.

Stability of gravity-driven thin-film flow in the presence of an adjacent gas phase

2021 ◽  
Vol 135 ◽  
pp. 103443
Author(s):  
R. Kushnir ◽  
I. Barmak ◽  
A. Ullmann ◽  
N. Brauner
Keyword(s):  
Thin Film ◽  
Gas Phase ◽  
Film Flow ◽  
Thin Film Flow ◽  
Gravity Driven

Control of Long-Lived Gas Emissions From Semiconductor Processing Equipment

1994 ◽  
Vol 344 ◽  
Author(s):  
Michael T. Mocella
Keyword(s):  
Thin Film ◽  
Global Warming ◽  
Gas Phase ◽  
Cross Sections ◽  
Semiconductor Industry ◽  
Absorption Cross ◽  
Semiconductor Processing ◽  
Gas Emissions ◽  
Industrial Policies ◽  
Global Warming Potentials

AbstractCertain perfluorocompounds (PFCs) - including CF4, C2F6, SF6, and NF3 - are widely used in gas phase thin film processing applications such as dry etching and CVD chamber cleaning. Through a combination of long atmospheric lifetimes and high infrared absorption cross sections, many PFCs have high global warming potentials (GWPs). Abatement of PFC emissions from semiconductor applications is consistent with existing and developing international, national, and industrial policies for the control of greenhouse gas emissions. For PFC applications in the semiconductor industry, there exist a number of promising options for emissions control. These options include destruction (comprising combustion, plasma, and chemical-thermal routes), recovery, and process replacement.

Gas-Phase Destruction of VOCs Using TiO2/UV and TiO2/O3/UV

1998 ◽  
Vol 3 (2) ◽  
Author(s):  
Rosana M. Alberici ◽  
Wilson F. Jardim
Keyword(s):  
Thin Film ◽  
Volatile Organic Compounds ◽  
Gas Phase ◽  
Organic Compounds ◽  
Aromatic Compounds ◽  
Photocatalytic Oxidation ◽  
Catalyst Deactivation ◽  
Volatile Organic ◽  
Film Reactor ◽  
Catalytic Deactivation

AbstractGas-phase photocatalytic oxidation of different classes of volatile organic compounds (VOCs), including alkanes, ketones, alcohols, chlorinated compounds and aromatic compounds, was investigated using an annular thin film reactor. For all organic compounds tested, catalytic deactivation was not observed, except for toluene (506 ppmv). For this compound, maximum destruction (87%) was maintained during the first 60 min of irradiation, dropping steadily due to catalyst deactivation to 20% after 150 min. The use of ozone as auxiliary agent in the photocatalytic oxidation of toluene and pyridine was also tested. For toluene, when O

Sign in / Sign up

Export Citation Format

Share Document