Simulation of Titanium Metal/Titanium Dioxide Etching with Chlorine and Hydrogen Chloride Gases Using the ReaxFF Reactive Force Field

2013 ◽  
Vol 117 (27) ◽  
pp. 5655-5663 ◽  
Author(s):  
Sung-Yup Kim ◽  
Adri C. T. van Duin
Langmuir ◽  
2013 ◽  
Vol 29 (25) ◽  
pp. 7838-7846 ◽  
Author(s):  
Sung-Yup Kim ◽  
Nitin Kumar ◽  
Petter Persson ◽  
Jorge Sofo ◽  
Adri C. T. van Duin ◽  
...  

2019 ◽  
Vol 25 (6) ◽  
Author(s):  
Longzhen Guo ◽  
Zhijun Zhou ◽  
Liping Chen ◽  
Shiquan Shan ◽  
Zhihua Wang

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