Interfacial Chemistry of Poly(methyl methacrylate) Arising from Exposure to Vacuum-Ultraviolet Light and Atomic Oxygen

Hanqiu Yuan; Daniel R. Killelea; Sanja Tepavcevic; Scott I. Kelber; S. J. Sibener

doi:10.1021/jp1061368

Interfacial Chemistry of Poly(methyl methacrylate) Arising from Exposure to Vacuum-Ultraviolet Light and Atomic Oxygen

The Journal of Physical Chemistry A ◽

10.1021/jp1061368 ◽

2011 ◽

Vol 115 (16) ◽

pp. 3736-3745 ◽

Cited By ~ 16

Author(s):

Hanqiu Yuan ◽

Daniel R. Killelea ◽

Sanja Tepavcevic ◽

Scott I. Kelber ◽

S. J. Sibener

Keyword(s):

Methyl Methacrylate ◽

Ultraviolet Light ◽

Atomic Oxygen ◽

Vacuum Ultraviolet ◽

Interfacial Chemistry ◽

Poly Methyl Methacrylate

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Spatially Defined Surface Modification of Poly(methyl methacrylate) Using 172 nm Vacuum Ultraviolet Light

Langmuir ◽

10.1021/la020478b ◽

2002 ◽

Vol 18 (23) ◽

pp. 9022-9027 ◽

Cited By ~ 74

Author(s):

Atsushi Hozumi ◽

Tomoko Masuda ◽

Kazuyuki Hayashi ◽

Hiroyuki Sugimura ◽

Osamu Takai ◽

...

Keyword(s):

Surface Modification ◽

Methyl Methacrylate ◽

Ultraviolet Light ◽

Vacuum Ultraviolet ◽

Poly Methyl Methacrylate

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A simple lithographic method employing 172 nm vacuum ultraviolet light to prepare positive- and negative-tone poly(methyl methacrylate) patterns

Thin Solid Films ◽

10.1016/j.tsf.2005.11.015 ◽

2006 ◽

Vol 500 (1-2) ◽

pp. 237-240 ◽

Cited By ~ 8

Author(s):

S. Asakura ◽

A. Hozumi ◽

T. Yamaguchi ◽

A. Fuwa

Keyword(s):

Methyl Methacrylate ◽

Ultraviolet Light ◽

Vacuum Ultraviolet ◽

Poly Methyl Methacrylate ◽

Negative Tone

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The Role of Gas Environment in Smoothing Surface Nanoroughness of Poly(methyl methacrylate) by Vacuum Ultraviolet Radiation

High Energy Chemistry ◽

10.1134/s0018143919010132 ◽

2019 ◽

Vol 53 (1) ◽

pp. 89-91

Author(s):

V. E. Skurat

Keyword(s):

Ultraviolet Radiation ◽

Methyl Methacrylate ◽

Vacuum Ultraviolet ◽

Poly Methyl Methacrylate ◽

Vacuum Ultraviolet Radiation ◽

Gas Environment

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Effect of ultraviolet light irradiation on etching process of poly(methyl methacrylate) by ion beam injections

Journal of Physics Conference Series ◽

10.1088/1742-6596/191/1/012030 ◽

2009 ◽

Vol 191 ◽

pp. 012030 ◽

Cited By ~ 1

Author(s):

S Yoshimura ◽

K Ikuse ◽

Y Tsukazaki ◽

M Kiuchi ◽

S Hamaguchi

Keyword(s):

Methyl Methacrylate ◽

Ultraviolet Light ◽

Ion Beam ◽

Etching Process ◽

Light Irradiation ◽

Poly Methyl Methacrylate ◽

Ultraviolet Light Irradiation

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Surface Modification of Poly(methyl methacrylate) by Hydrogen-Plasma Exposure and Its Sputtering Characteristics by Ultraviolet Light Irradiation

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.090201 ◽

2013 ◽

Vol 52 (9R) ◽

pp. 090201 ◽

Cited By ~ 17

Author(s):

Satoru Yoshimura ◽

Kazumasa Ikuse ◽

Satoshi Sugimoto ◽

Kensuke Murai ◽

Kuniaki Honjo ◽

...

Keyword(s):

Surface Modification ◽

Methyl Methacrylate ◽

Ultraviolet Light ◽

Hydrogen Plasma ◽

Light Irradiation ◽

Plasma Exposure ◽

Poly Methyl Methacrylate ◽

Ultraviolet Light Irradiation

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Imaging characteristics of poly(methyl methacrylate) at vacuum ultraviolet wavelengths

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589493 ◽

1997 ◽

Vol 15 (4) ◽

pp. 828 ◽

Cited By ~ 10

Author(s):

I. E. Ferincz

Keyword(s):

Methyl Methacrylate ◽

Vacuum Ultraviolet ◽

Poly Methyl Methacrylate ◽

Imaging Characteristics

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Vacuum ultraviolet smoothing of nanometer-scale asperities of Poly(methyl methacrylate) surface

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques ◽

10.1134/s1027451010010015 ◽

2010 ◽

Vol 4 (1) ◽

pp. 1-11 ◽

Cited By ~ 14

Author(s):

R. V. Lapshin ◽

A. P. Alekhin ◽

A. G. Kirilenko ◽

S. L. Odintsov ◽

V. A. Krotkov

Keyword(s):

Methyl Methacrylate ◽

Vacuum Ultraviolet ◽

Nanometer Scale ◽

Poly Methyl Methacrylate

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Sensitivity of mixtures of syndiotactic and isotactic poly(methyl methacrylate) to chain scission induced by ultraviolet light

Journal of Polymer Science Part B Polymer Letters ◽

10.1002/pol.1967.110050119 ◽

1967 ◽

Vol 5 (1) ◽

pp. 101-104 ◽

Cited By ~ 7

Author(s):

Donald G. Gardner ◽

George A. Henry

Keyword(s):

Methyl Methacrylate ◽

Ultraviolet Light ◽

Chain Scission ◽

Poly Methyl Methacrylate

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Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+/ ${\rm CF}_3^+$ ion bombardment with vacuum ultraviolet (VUV) photon irradiation

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/45/50/505201 ◽

2012 ◽

Vol 45 (50) ◽

pp. 505201 ◽

Cited By ~ 10

Author(s):

Satoru Yoshimura ◽

Yasuhiro Tsukazaki ◽

Masato Kiuchi ◽

Satoshi Sugimoto ◽

Satoshi Hamaguchi

Keyword(s):

Surface Modification ◽

Methyl Methacrylate ◽

Vacuum Ultraviolet ◽

Ion Bombardment ◽

Low Energy ◽

Poly Methyl Methacrylate ◽

Photon Irradiation ◽

Sputtering Yields

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Photophysical and Lasing Properties of New Analogs of the Boron–dipyrromethene Laser Dye Pyrromethene 567 Incorporated into or Covalently Bounded to Solid Matrices of Poly(methyl methacrylate)¶

Photochemistry and Photobiology ◽

10.1562/0031-8655(2003)078<0030:palpon>2.0.co;2 ◽

2003 ◽

Vol 78 (1) ◽

pp. 30 ◽

Cited By ~ 28

Author(s):

F. López Arbeloa ◽

J. Bañuelos Prieto ◽

I. López Arbeloa ◽

A. Costela ◽

I. García-Moreno ◽

...

Keyword(s):

Methyl Methacrylate ◽

Laser Dye ◽

Poly Methyl Methacrylate ◽

Boron Dipyrromethene ◽

Solid Matrices

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