Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel

2010 ◽  
Vol 114 (41) ◽  
pp. 17286-17292 ◽  
Author(s):  
Jeffrey W. Elam ◽  
Joseph A. Libera ◽  
Trang H. Huynh ◽  
Hao Feng ◽  
Michael J. Pellin
Author(s):  
Sungho Park ◽  
Byung Jun Kim ◽  
Tae Yeon Kim ◽  
Eui Young Jung ◽  
Kyu-Myung Lee ◽  
...  

We have developed a visible-light phototransistor with excellent photodetection characteristics and stability via atomic layer deposition (ALD) to add a thin layer of aluminum oxide (Al2O3) to quantum dot (QD)/zinc oxide (ZnO) films.


2010 ◽  
Vol 20 (18) ◽  
pp. 3099-3105 ◽  
Author(s):  
David J. Comstock ◽  
Steven T. Christensen ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin ◽  
Mark C. Hersam

2012 ◽  
Vol 30 (1) ◽  
pp. 01A127 ◽  
Author(s):  
Annelies Delabie ◽  
Sonja Sioncke ◽  
Jens Rip ◽  
Sven Van Elshocht ◽  
Geoffrey Pourtois ◽  
...  

Nano Letters ◽  
2020 ◽  
Vol 20 (9) ◽  
pp. 6884-6890
Author(s):  
Wang Ke ◽  
Yang Liu ◽  
Xuelong Wang ◽  
Xiangdong Qin ◽  
Limei Chen ◽  
...  

2011 ◽  
Vol 110 (12) ◽  
pp. 123514 ◽  
Author(s):  
N. Biluš Abaffy ◽  
D. G. McCulloch ◽  
J. G. Partridge ◽  
P. J. Evans ◽  
G. Triani

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