Shallow Electron Trap, Interfacial Water, and Outer-Sphere Adsorbed Oxalate IR Absorptions Correlate during UV Irradiation of Photocatalytic TiO2 Films in Aqueous Solution

2010 ◽  
Vol 115 (4) ◽  
pp. 902-907 ◽  
Author(s):  
David M. Savory ◽  
David S. Warren ◽  
A. James McQuillan
Keyword(s):  
Aqueous Solution ◽  
Uv Irradiation ◽  
Outer Sphere ◽  
Electron Trap ◽  
Interfacial Water ◽  
Tio2 Films ◽  
Photocatalytic Tio2

Oxidative etching of MoS2/WS2 nanosheets to their QDs by facile UV irradiation

2016 ◽  
Vol 18 (45) ◽  
pp. 31211-31216 ◽  
Author(s):  
Xiaolong Lu ◽  
Rongguo Wang ◽  
Lifeng Hao ◽  
Fan Yang ◽  
Weicheng Jiao ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Uv Irradiation ◽  
Oh Radicals ◽  
Oxidative Etching ◽  
Ws2 Nanosheets

˙OH radicals produced under UV irradiation in aqueous solution induce the oxidative etching of MoS2/WS2 nanosheets to QDs.

scholarly journals Preparation, Characterization, and Photocatalytic Properties of Modified Red Mud

2015 ◽  
Vol 2015 ◽  
pp. 1-6 ◽  
Author(s):  
Mingjie Ma ◽  
Guanyu Wang ◽  
Zhengpeng Yang ◽  
Shanxiu Huang ◽  
Weijie Guo ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Aqueous Solution ◽  
Scanning Electron Microscopy ◽  
Uv Irradiation ◽  
Red Mud ◽  
Structure Property ◽  
X Ray Diffraction ◽  
X Ray ◽  
Xrf Scanning ◽  
Scanning Electron

Solid waste red mud was modified by HCl leaching. The structure property and composition of modified red mud were investigated by X-ray diffraction (XRD), X-ray fluorescence spectroscopy (XRF), scanning electron microscopy (SEM), and Brunauer-Emmett-Teller (BET). Under UV irradiation, methyl orange (MO) aqueous solution was photodegraded by modified red mud. The obtained results showed that the specific surface area of modified red mud was 317.14 m2/g, which was about 40 times higher than that of the normal red mud. After UV irradiation for 50 min, the removal percentage of MO reached 94.2%. The study provided a novel way for the application of red mud to the photocatalytic degradation of organic wastes.

Photostability of the UV filter benzophenone-3 and its effect on the photodegradation of benzotriazole in water

2011 ◽  
Vol 8 (6) ◽  
pp. 581 ◽  
Author(s):  
You-Sheng Liu ◽  
Guang-Guo Ying ◽  
Ali Shareef ◽  
Rai S. Kookana
Keyword(s):  
Aqueous Solution ◽  
Uv Irradiation ◽  
Environmental Fate ◽  
Solar Light ◽  
Ultraviolet Rays ◽  
Uv Filter ◽  
Small Loss ◽  
Bond Scission ◽  
Solar Radiation Exposure ◽  
Pure Aqueous Solution

Environmental contextThe environmental fate of a particular contaminant can be influenced by the presence of other chemicals. It is shown that the photodegradation in water of benzotriazole, a common household and industrial chemical, is reduced in the presence of a sunscreen compound. Thus, contaminants such as benzotriazole may persist longer in the environment in the presence of chemicals designed to filter ultraviolet rays, such as those used in sunscreens. AbstractThe presence of co-solutes (e.g. UV filters) can potentially influence the environmental fate of micropollutants. The photolysis of benzotriazole (BT, an anticorrosion agent) and benzophenone-3 (BP-3, a UV filter), as well as their interactions in aqueous solutions under UV and artificial solar light with or without added humic acid (HA) and metal ions (Cu2+ and Fe3+), has been investigated. BT was found to be photosensitive under UV irradiation, but photostable under solar light. The half-lives for the photolysis of BT were 2.8 h in pure aqueous solution and increasing to 4.5 h in the presence of BP-3 (1.0 mg L–1). BP-3 was photostable under both UV and artificial solar light. Solar radiation exposure of 50 days resulted in a small loss of BP-3 (8 %) in pure aqueous solution, and resulted in a greater loss of BP-3 (up to 31 %) at 50 mg L–1 of HA. UV irradiation of the BT solutions containing BP-3 led to formation of five photoproducts, formed mainly by N–N and N–NH bond scission, polymerisation and hydroxylation. In the case of BP-3, one major photoproduct was isolated and tentatively identified as 2,4-dimethylanisole, formed by the loss of hydroxy and benzoyl groups.

scholarly journals Influence of oxygen flow rate on photocatalytic TiO2 films deposited by rf magnetron sputtering

2011 ◽  
Vol 23 (2) ◽  
pp. 589-594 ◽  
Author(s):  
A. H. Chiou ◽  
C. G. Kuo ◽  
C. H. Huang ◽  
W. F. Wu ◽  
C. P. Chou ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Flow Rate ◽  
Rf Magnetron Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Tio2 Films ◽  
Photocatalytic Tio2
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