Dependence of the Vertically Aligned Growth of Carbon Nanotubes on the Catalysts

2002 ◽  
Vol 106 (36) ◽  
pp. 9286-9290 ◽  
Author(s):  
Nam Seo Kim ◽  
Yun Tack Lee ◽  
Jeunghee Park ◽  
Hyun Ryu ◽  
Hwack Joo Lee ◽  
...  
Author(s):  
Kuei-Yi Lee ◽  
Shin-ichi Honda ◽  
Mitsuhiro Katayama ◽  
Takashi Miyake ◽  
Katsuya Himuro ◽  
...  

2009 ◽  
Vol 113 (35) ◽  
pp. 15484-15491 ◽  
Author(s):  
Gyula Eres ◽  
C. M. Rouleau ◽  
Mina Yoon ◽  
A. A. Puretzky ◽  
J. J. Jackson ◽  
...  

2003 ◽  
Vol 772 ◽  
Author(s):  
Masakazu Muroyama ◽  
Kazuto Kimura ◽  
Takao Yagi ◽  
Ichiro Saito

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.


2013 ◽  
Vol 3 (2) ◽  
pp. 155-165 ◽  
Author(s):  
Teresa C.O. Marsi ◽  
Marcus A.F. Corat ◽  
Mirian M. Machado ◽  
Evaldo J. Corat ◽  
Fernanda R. Marciano ◽  
...  

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