Chemical Modification of Self-Assembled Monolayers by Exposure to Soft X-rays in Air

2000 ◽  
Vol 104 (31) ◽  
pp. 7403-7410 ◽  
Author(s):  
Tae K. Kim ◽  
Xiao M. Yang ◽  
Richard D. Peters ◽  
B. H. Sohn ◽  
Paul F. Nealey
Keyword(s):  
Chemical Modification ◽  
Self Assembled Monolayers ◽  
X Rays ◽  
Assembled Monolayers ◽  
Self Assembled

Chemical Manipulation by X-rays of Functionalized Thiolate Self-Assembled Monolayers on Au

Langmuir ◽  
2008 ◽  
Vol 24 (24) ◽  
pp. 13969-13976 ◽  
Author(s):  
P. Iqbal ◽  
K. Critchley ◽  
D. Attwood ◽  
D. Tunnicliffe ◽  
S. D. Evans ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
X Rays ◽  
Assembled Monolayers ◽  
Self Assembled

Chemical modification and patterning of self assembled monolayers using scanning electron and ion-beam lithography

2011 ◽  
Vol 88 (8) ◽  
pp. 1948-1950
Author(s):  
Maria Jesús Pérez Roldán ◽  
César Pascual García ◽  
Gerardo Marchesini ◽  
Douglas Gilliland ◽  
Giacomo Ceccone ◽  
...  
Keyword(s):  
Chemical Modification ◽  
Ion Beam ◽  
Self Assembled Monolayers ◽  
Ion Beam Lithography ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Scanning Electron

Self-Assembled Patterning of Ultrathin Silicides by Local Oxidation

MRS Bulletin ◽  
1999 ◽  
Vol 24 (8) ◽  
pp. 31-35 ◽  
Author(s):  
S. Mantl ◽  
Q.T. Zhao ◽  
B. Kabius
Keyword(s):  
Self Assembly ◽  
Vertical Direction ◽  
Self Assembled Monolayers ◽  
X Rays ◽  
Precise Control ◽  
Spacer Layer ◽  
Local Oxidation ◽  
Assembled Monolayers ◽  
Alternative Approaches ◽  
Self Assembled

Most microfabrication techniques employ masks to transfer the desired microstructure onto a wafer using ultraviolet light, x-rays, electrons, or ions for the projection of the structures. Generally, photoresist processing and etching follow to form the final structures. In all cases, the facilities necessary to perform these processes grow increasingly more complex as the feature size of the structures diminishes, and these processes face their practical or economic limits at dimensions of about 50 nm. Thus alternative approaches are under investigation, including different self-assembly techniques. They require no costly facilities and no masks with nanometer structures, and they promise high throughput, since the patterning is directly achieved by a physical or chemical process. Self-assembled monolayers of long-chain organic molecules are the most widely studied examples, where chemisorption and spontaneous self-ordering of the molecules are observed on appropriate substrates. Another interesting example is island-ordering, laterally or in a vertical direction, during epitaxial growth. The lattice-mismatched islands tend to nucleate preferentially on top of each other when separated by a thin spacer layer, due to the associated strain field. Another approach is the use of specific stressor layers on the surface to obtain alignment of buried precipitates along the stressor lines. However, the main challenges of all self-assembly techniques are precise control of the dimensions of the structures and reproducibility.

Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers

Langmuir ◽  
2000 ◽  
Vol 16 (10) ◽  
pp. 4625-4631 ◽  
Author(s):  
Richard D. Peters ◽  
Xiao M. Yang ◽  
Tae K. Kim ◽  
B. H. Sohn ◽  
Paul F. Nealey
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Self Assembled Monolayers ◽  
X Rays ◽  
Wetting Behavior ◽  
Assembled Monolayers ◽  
Self Assembled
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