In Situ Observation of a Surface Chemical Reaction by Fast X-Ray Photoelectron Spectroscopy

1999 ◽  
Vol 121 (34) ◽  
pp. 7969-7970 ◽  
Author(s):  
Adam F. Lee ◽  
Karen Wilson ◽  
Ruth L. Middleton ◽  
Alessandro Baraldi ◽  
Andrea Goldoni ◽  
...  
2011 ◽  
Vol 306-307 ◽  
pp. 238-241 ◽  
Author(s):  
Hendrik C. Swart ◽  
Jacobus J. Terblans ◽  
I.M. Nagpure ◽  
S.S. Pitale ◽  
O.M. Ntwaeaborwa

Borates, phosphates, aluminates, silicates or sulphides are usually used as host lattices for display phosphors. These phosphors reacted similarly under electron bombardment. Nano and micron phosphors normally lose brightness upon bombardment with electron, ion or photon beams. A combination of techniques such as XPS (X-ray photoelectron spectroscopy), AES (Auger electron spectroscopy) and CL (cathodoluminescence) spectroscopy were used to show that the main reason for the degradation in luminescent intensity, of the different phosphors, under electron bombardment is the formation of a non-luminescent layer on the surface due to an electron stimulated surface chemical reaction (ESSCR). The decrease in luminance was found to be the result of the growing of a “dead layer” on the surface. In some cases, however, a thermodynamically stable layer formed on the surface as a result of the electron stimulated surface chemical reactions lead to CL stability of the phosphor. The formation of an altered layer (oxide layer) on the surface of the different phosphors leads to a decrease in the luminescent intensity at that specific wavelength and in some cases to an increase of the intensity at another wavelength.


2002 ◽  
Vol 16 (06n07) ◽  
pp. 1132-1137 ◽  
Author(s):  
N. JIANG ◽  
S. XU ◽  
K. N. OSTRIKOV ◽  
E. L. TSAKADZE ◽  
J. D. LONG ◽  
...  

An attempt for modification of carbon nitride material by introduction of Al to form a ternary Al-C-N compound in a thin film deposited using inductively coupled plasma (ICP) assisted DC magnetron sputtering is reported. Optical emission spectroscopy (OES) is used for in-situ observation and identification of reactive species. The films were characterized using x-ray photoelectron spectroscopy (XPS) and x-ray diffraction spectroscopy (XRD). The results indicate that C-N bond is formed in the plasma. The XPS narrow scam spectra confirm the existence of C-Al, sp2C-N and sp3C-N bonds. Elemental proportion of carbon increases with the CH4/N2 flow rate ratio, and has a tendency to saturate. The film is dominated by c-AlN (111), mixed with Al4C3 and AlCN ternary compound.


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