Multilength-Scale Chemical Patterning of Self-Assembled Monolayers by Spatially Controlled Plasma Exposure: Nanometer to Centimeter Range

2009 ◽  
Vol 131 (31) ◽  
pp. 10984-10991 ◽  
Author(s):  
Meng-Hsien Lin ◽  
Chi-Fan Chen ◽  
Hung-Wei Shiu ◽  
Chia-Hao Chen ◽  
Shangjr Gwo
Author(s):  
Jinan Chai ◽  
Baoming Li ◽  
Daniel Y. Kwok

In this paper, we will demonstrate a selective surface patterning method by a micro-plasma discharge. In this method, argon plasma is ignited through a hole of copper clad polyimide microstructure electrodes. As an illustration, experiments were performed in which an octadecanethiol (CH3(CH2)17SH) self-assembled monolayer (SAM) on a gold film is exposed to a microdischarge and subsequently followed by immersion into the 16-mercaptohexadecanoic acid (COOH(CH2)15SH) solution. The octadecanethiol SAM is desorbed upon Ar plasma exposure, allowing the formation of a second SAM on the damaged region [Chai et al, App. Phys. Lett., 86, 034107 (2005)]. The patterned samples are viewed by using optical microscope and scanning electron microscopy. The advantage of this approach is that it is noncontact and eliminates the need of photolithography. The patterned samples can be employed to microfluidic self-propelled movement.


1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier

2003 ◽  
Vol 104 ◽  
pp. 459-462 ◽  
Author(s):  
R. Klauser ◽  
M. Zharnikov ◽  
I.-H. Hong ◽  
S.-C. Wang ◽  
A. Gölzhäuser ◽  
...  

2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE

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