Photocontrol over the Disorder-to-Order Transition in Thin Films of Polystyrene-block-poly(methyl methacrylate) Block Copolymers Containing Photodimerizable Anthracene Functionality

2011 ◽  
Vol 133 (43) ◽  
pp. 17217-17224 ◽  
Author(s):  
Wei Chen ◽  
Jia-Yu Wang ◽  
Wei Zhao ◽  
Le Li ◽  
Xinyu Wei ◽  
...  
2019 ◽  
Vol 2019 ◽  
pp. 1-11 ◽  
Author(s):  
Claudia Piñón-Balderrama ◽  
César Leyva-Porras ◽  
Roberto Olayo-Valles ◽  
Javier Revilla-Vázquez ◽  
Ulrich S. Schubert ◽  
...  

Poly(methyl methacrylate-block-styrene) block copolymers (BCs) of low dispersity were selectively sulfonated on the styrenic segment. Several combinations of degree of polymerization and volume fraction of each block were investigated to access different self-assembled morphologies. Thin films of the sulfonated block copolymers were prepared by spin-coating and exposed to solvent vapor (SVA) or thermal annealing (TA) to reach equilibrium morphologies. Atomic force microscopy (AFM) was employed for characterizing the films, which exhibited a variety of nanometric equilibrium and nonequilibrium morphologies. Highly sulfonated samples revealed the formation of a honeycomb-like morphology obtained in solution rather than by the self-assembly of the BC in the solid state. The described morphologies may be employed in applications such as templates for nanomanufacturing and as cover and binder of catalytic particles in fuel cells.


2015 ◽  
Vol 340 ◽  
pp. 72-77 ◽  
Author(s):  
S. Zongo ◽  
A.P. Kerasidou ◽  
B.T. Sone ◽  
A. Diallo ◽  
P. Mthunzi ◽  
...  

1999 ◽  
Vol 81 (4) ◽  
pp. 285-291 ◽  
Author(s):  
Jinman Huang ◽  
Vlasoula Bekiari ◽  
Panagiotis Lianos ◽  
Stelios Couris

2018 ◽  
Vol 5 (1) ◽  
pp. 20-22
Author(s):  
Chandar Shekar B ◽  
Ranjit Kumar R ◽  
Dinesh K.P.B ◽  
Sulana Sundari C ◽  
Punithavathi K

Thin films of poly (methyl methacrylate) (PMMA) were prepared on cleaned glass slides by using spin coating technique. The prepared films were identified by using FTIR spectrum. Surface morphology of the coated films was studied by using SEM and AFM. Both as grown and annealed films showed smooth and amorphous structure. It also revealed the absence of pits, pin holes and dendritic features in the surface. Both as grown and annealed films showed very low RMS roughness value. The morphology analysis revealed that the prepared film could be used as dielectric layer in thin film transistors and as drug delivery system forwound healing.


2018 ◽  
Vol 18 (3) ◽  
pp. 537 ◽  
Author(s):  
Melahat Göktaş ◽  
Guodong Deng

Poly(methyl methacrylate)-b-poly(N-isopropylacrylamide) [PMMA-b-PNIPAM] block copolymers were obtained by a combination of redox polymerization and atom transfer radical polymerization (ATRP) methods in two steps. For this purpose, PMMA macroinitator (ATRP-macroinitiator) was synthesized by redox polymerization of methyl methacrylate and 3-bromo-1-propanol using Ce(NH4)2(NO3)6 as a catalyst. The synthesis of PMMA-b-PNIPAM block copolymers was carried out by means of ATRP of ATRP-macroinitiator and NIPAM at 60 °C. The block copolymers were obtained in high yield and high molecular weight. The characterization of products was accomplished by using multi instruments and methods such as nuclear magnetic resonance spectroscopy, Fourier transform infrared spectroscopy, gel permeation chromatography, and thermogravimetric analysis.


Sign in / Sign up

Export Citation Format

Share Document