Evidence of a Borderline Region between E1cb and E2 Elimination Reaction Mechanisms:  A Combined Experimental and Theoretical Study of Systems Activated by the Pyridine Ring

2005 ◽  
Vol 127 (43) ◽  
pp. 15151-15160 ◽  
Author(s):  
Sergio Alunni ◽  
Filippo De Angelis ◽  
Laura Ottavi ◽  
Magdalini Papavasileiou ◽  
Francesco Tarantelli
Keyword(s):  
Reaction Mechanisms ◽  
Pyridine Ring ◽  
Theoretical Study ◽  
Elimination Reaction

Reactivity and reaction mechanisms of sulfate radicals with lindane: An experimental and theoretical study

2021 ◽  
pp. 111523
Author(s):  
Lei He ◽  
Lingjun Bu ◽  
Richard Spinney ◽  
Dionysios D. Dionysiou ◽  
Ruiyang Xiao
Keyword(s):  
Reaction Mechanisms ◽  
Theoretical Study ◽  
Sulfate Radicals

Theoretical study of the dark-oxidation reaction mechanisms for organic polymers

2006 ◽  
Vol 427 (1-3) ◽  
pp. 35-40 ◽  
Author(s):  
Guixiu Wang ◽  
Rongxiu Zhu ◽  
Dongju Zhang ◽  
Chengbu Liu
Keyword(s):  
Reaction Mechanisms ◽  
Oxidation Reaction ◽  
Theoretical Study ◽  
Organic Polymers

A theoretical study on the elimination reaction of acrylonitrile from 2′-O-cyanoethylated nucleosides by Bu4NF

Tetrahedron ◽  
2019 ◽  
Vol 75 (1) ◽  
pp. 1-9 ◽  
Author(s):  
Kaori Ando ◽  
Hisao Saneyoshi ◽  
Kohji Seio ◽  
Mitsuo Sekine
Keyword(s):  
Theoretical Study ◽  
Elimination Reaction

Contribution to the Theoretical Study of Reaction Mechanisms

1979 ◽  
pp. 91-144 ◽  
Author(s):  
G. Leroy ◽  
M. Sana ◽  
L. A. Burke ◽  
M.-T. Nguyen
Keyword(s):  
Reaction Mechanisms ◽  
Theoretical Study

Theoretical Study on the Reaction Mechanisms of CH3O– with O2(X3Σg–) and O2(a1Δg)

2012 ◽  
Vol 116 (47) ◽  
pp. 11656-11667
Author(s):  
Hai-xia Lin ◽  
Hai-long Liang ◽  
Guang-hui Chen ◽  
Feng-long Gu ◽  
Wen-guang Liu ◽  
...  
Keyword(s):  
Reaction Mechanisms ◽  
Theoretical Study

Low Temperature Synthesis of Plasma Teos SiO2

1996 ◽  
Vol 446 ◽  
Author(s):  
T. Itani ◽  
S. Fukuyama
Keyword(s):  
Reaction Mechanisms ◽  
Plasma Reactor ◽  
Substrate Surface ◽  
Condensation Reaction ◽  
Excitation Frequency ◽  
Elimination Reaction ◽  
Film Properties ◽  
Low Temperature Synthesis ◽  
Temperature Synthesis ◽  
Precursor Molecules

AbstractIn this study, we investigated the deposition temperature's affect on TEOS based Si02 properties and reaction mechanisms while changing the excitation frequency. We used a parallel-plate plasma reactor, and either 100 kHz or 13.56 MHz radio frequency to generate plasma. We found that 100 kHz plasma promotes SiO formation and improves the film properties at low deposition temperatures. We assume this to be due to the supplement of higher energy ions to the substrate surface in 100 kHz plasma. This in turn promotes the elimination reaction (condensation reaction) of OH that links to Si atoms as a terminator of surface SiO networks or precursor molecules.

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