The Dissociation Constants of Some Dihalides of Dimethyl Sulfide and Dimethyl Selenide in Carbon Tetrachloride Solution

1957 ◽  
Vol 79 (5) ◽  
pp. 1031-1033 ◽  
Author(s):  
N. W. Tideswell ◽  
J. D. McCullough
Keyword(s):  
Carbon Tetrachloride ◽  
Dimethyl Sulfide ◽  
Dissociation Constants ◽  
Carbon Tetrachloride Solution ◽  
Dimethyl Selenide

The Photo‐Chlorination of Methyl Chloroformate in Carbon Tetrachloride Solution

1949 ◽  
Vol 17 (6) ◽  
pp. 566-573 ◽  
Author(s):  
T. L. Batke ◽  
L. M. Dorfman ◽  
D. J. LeRoy
Keyword(s):  
Carbon Tetrachloride ◽  
Carbon Tetrachloride Solution

Synthesis of Silicon Carbide Films from Partially Oxidized Polyvinylsilane by Carbon Tetrachloride Solution Casting

2002 ◽  
Vol 17 (1) ◽  
pp. 214-223 ◽  
Author(s):  
Masaki Narisawa ◽  
Takeshi Hasegawa ◽  
Kiyohito Okamura ◽  
Masayoshi Itoh ◽  
Thomas Apple ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Carbon Tetrachloride ◽  
Radical Polymerization ◽  
Air Flow ◽  
Spectroscopic Studies ◽  
Flow Time ◽  
Silica Layer ◽  
Solution Casting ◽  
Amorphous Films ◽  
Carbon Tetrachloride Solution

Polyvinylsilane (PVS), derived from vinylsilane by radical polymerization, was partially oxidized in hot carbon tetrachloride solution by flowing air. If the air flow time is adjusted, soft gel films can be formed in a Teflon dish by casting the PVS solution. After the PVS films were peeled from the substrates, they were pyrolyzed at various temperatures. Spectroscopic studies of the pyrolyzed films up to 1273 K suggested that carbosilane (Si–CH2–Si) structures are formed in the films at 473–673 K. The compositions of the amorphous films obtained at 1673 K were approximately SiC1.38O0.21 and SiC1.41O0.51, depending on the crosslinking conditions. The oxygen incorporated in the films was removed in the form of CO and SiO during further heating at 1673–1873 K. The compositions of the films were changed to approximately SiC1.25 and SiC1.26, respectively, at 2073 K. The films obtained at 1273 K did not show degradation during the oxidation at 1273–1673 K while a protective silica layer was formed on their surfaces.

MICRODETERMINATION OF COBALT COLORIMETRICALLY AS THE 1-NITROSO-2-NAPHTHOL COMPLEX

1953 ◽  
Vol 31 (2) ◽  
pp. 145-149 ◽  
Author(s):  
W. E. Nichol
Keyword(s):  
Carbon Tetrachloride ◽  
Cobalt Complex ◽  
Visible Spectrum ◽  
Maximum Absorption ◽  
Order Of Accuracy ◽  
Carbon Tetrachloride Solution ◽  
Iron Interference

An advantage of determining cobalt with 1-nitroso-2-naphthol is that the reagent is relatively stable and forms a very stable cobalt complex. Also this cobalt complex has maximum absorption in the visible spectrum which allows determination visually or with ordinary colorimeters.The procedure is based on decreasing the iron interference by the removal of part of the iron as phosphate and on a simple purification of the carbon tetrachloride solution of the 1-nitroso-2-naphthol cobalt complex which eliminates traces of palladium, iron, etc.The method has the same order of accuracy as the o-nitrosocresol method but preparation of reagents and the analysis in general require less time.

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