The Effect of Wave Length on the Iodine-Sensitized Decomposition of Ethylene Iodide in Carbon Tetrachloride Solution

1935 ◽  
Vol 57 (12) ◽  
pp. 2382-2386 ◽  
Author(s):  
Roscoe G. Dickinson ◽  
Nelson P. Nies
1938 ◽  
Vol 16b (11) ◽  
pp. 382-389 ◽  
Author(s):  
M. H. Kalina ◽  
J. W. T. Spinks

Some chemical and physical properties of dichlorine hexoxide are described and attention is drawn to its dangerous property of exploding violently on contact with organic substances.The extinction coefficient of solutions of dichlorine hexoxide in carbon tetrachloride solution for a wave-length of 5460 Å has been measured and found to be 2.4, which is very much less than that of liquid dichlorine hexoxide for the same wave-length. A colorimetric method is described for the quantitative estimation of dichlorine hexoxide in solutions. The molecular weight of dichlorine hexoxide in carbon tetrachloride solution has been redetermined, and it confirms the formula Cl2O6.Solutions of dichlorine hexoxide in carbon tetrachloride are decomposed photochemically by green light. Gaseous chlorine trioxide (ClO3) is decomposed photochemically by λ3650. Its decomposition is photosensitized by chlorine and bromine, the quantum yield in the chlorine sensitized reaction being about 1.


1949 ◽  
Vol 17 (6) ◽  
pp. 566-573 ◽  
Author(s):  
T. L. Batke ◽  
L. M. Dorfman ◽  
D. J. LeRoy

2002 ◽  
Vol 17 (1) ◽  
pp. 214-223 ◽  
Author(s):  
Masaki Narisawa ◽  
Takeshi Hasegawa ◽  
Kiyohito Okamura ◽  
Masayoshi Itoh ◽  
Thomas Apple ◽  
...  

Polyvinylsilane (PVS), derived from vinylsilane by radical polymerization, was partially oxidized in hot carbon tetrachloride solution by flowing air. If the air flow time is adjusted, soft gel films can be formed in a Teflon dish by casting the PVS solution. After the PVS films were peeled from the substrates, they were pyrolyzed at various temperatures. Spectroscopic studies of the pyrolyzed films up to 1273 K suggested that carbosilane (Si–CH2–Si) structures are formed in the films at 473–673 K. The compositions of the amorphous films obtained at 1673 K were approximately SiC1.38O0.21 and SiC1.41O0.51, depending on the crosslinking conditions. The oxygen incorporated in the films was removed in the form of CO and SiO during further heating at 1673–1873 K. The compositions of the films were changed to approximately SiC1.25 and SiC1.26, respectively, at 2073 K. The films obtained at 1273 K did not show degradation during the oxidation at 1273–1673 K while a protective silica layer was formed on their surfaces.


1953 ◽  
Vol 31 (2) ◽  
pp. 145-149 ◽  
Author(s):  
W. E. Nichol

An advantage of determining cobalt with 1-nitroso-2-naphthol is that the reagent is relatively stable and forms a very stable cobalt complex. Also this cobalt complex has maximum absorption in the visible spectrum which allows determination visually or with ordinary colorimeters.The procedure is based on decreasing the iron interference by the removal of part of the iron as phosphate and on a simple purification of the carbon tetrachloride solution of the 1-nitroso-2-naphthol cobalt complex which eliminates traces of palladium, iron, etc.The method has the same order of accuracy as the o-nitrosocresol method but preparation of reagents and the analysis in general require less time.


Sign in / Sign up

Export Citation Format

Share Document