Characterization of (methylcyclopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metal

Ziling Xue; M. Jane Strouse; David K. Shuh; Carolyn B. Knobler; Herbert D. Kaesz; Robert F. Hicks; R. Stanley Williams

doi:10.1021/ja00206a002

Characterization of (methylcyclopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metal

Journal of the American Chemical Society ◽

10.1021/ja00206a002 ◽

1989 ◽

Vol 111 (24) ◽

pp. 8779-8784 ◽

Cited By ~ 73

Author(s):

Ziling Xue ◽

M. Jane Strouse ◽

David K. Shuh ◽

Carolyn B. Knobler ◽

Herbert D. Kaesz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Platinum Metal ◽

Organometallic Chemical Vapor Deposition

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Characterization of (methylcylcopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metal [Erratum to document cited in CA111(25):233169n]

Journal of the American Chemical Society ◽

10.1021/ja00166a085 ◽

1990 ◽

Vol 112 (10) ◽

pp. 4090-4090 ◽

Cited By ~ 1

Author(s):

Ziling Xue ◽

M. Jane Strouse ◽

David K. Shuh ◽

Carolyn B. Knobler ◽

Herbert D. Kaesz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Platinum Metal ◽

Organometallic Chemical Vapor Deposition

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ChemInform Abstract: Characterization of (Methylcyclopentadienyl)trimethylplatinum and Low-Temperature Organometallic Chemical Vapor Deposition of Platinum Metal.

ChemInform ◽

10.1002/chin.199010279 ◽

1990 ◽

Vol 21 (10) ◽

Author(s):

Z. XUE ◽

M. J. STROUSE ◽

D. K. SHUH ◽

C. B. KNOBLER ◽

H. D. KAESZ ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Platinum Metal ◽

Abstract Characterization ◽

Organometallic Chemical Vapor Deposition

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Cross-sectional TEM characterization of low temperature (750-800°C) epitaxial silicon by very low pressure (6 mTorr) chemical vapor deposition with and without plasma enhancement

Journal of Electronic Materials ◽

10.1007/bf02652144 ◽

1988 ◽

Vol 17 (2) ◽

pp. 139-148 ◽

Cited By ~ 4

Author(s):

T. R. Yew ◽

J. H. Comfort ◽

L. M. Garverick ◽

W. R. Burger ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Epitaxial Silicon ◽

Cross Sectional ◽

Tem Characterization ◽

Plasma Enhancement

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The Low Temperature Catalyzed Chemical Vapor Deposition and Characterization of Silicon Nitride Thin Films

Journal of The Electrochemical Society ◽

10.1149/1.2069356 ◽

1992 ◽

Vol 139 (4) ◽

pp. 1151-1159 ◽

Cited By ~ 28

Author(s):

Jeffrey L. Dupuie ◽

Erdogan Gulari ◽

Fred Terry

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor

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Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor deposition

Materials Research Bulletin ◽

10.1016/0025-5408(89)90128-1 ◽

1989 ◽

Vol 24 (2) ◽

pp. 213-219 ◽

Cited By ~ 15

Author(s):

Angus B. Laurie ◽

Michael L. Norton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Normal Pressure ◽

Metalorganic Chemical

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Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films

10.1063/1.2799445 ◽

2007 ◽

Cited By ~ 1

Author(s):

F. Ferrieu ◽

C. Chaton ◽

D. Neira ◽

C. Beitia ◽

L. Proenca Mota ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Characterization ◽

Carbon Films ◽

Amorphous Carbon Films

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The low temperature catalyzed chemical vapor deposition and characterization of aluminum nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578135 ◽

1992 ◽

Vol 10 (1) ◽

pp. 18-28 ◽

Cited By ~ 56

Author(s):

Jeffrey L. Dupuie ◽

Erdogan Gulari

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Aluminum Nitride ◽

Vapor Deposition ◽

Chemical Vapor

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Real-time optical characterization of heteroepitaxy by organometallic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582323 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1184-1189 ◽

Cited By ~ 14

Author(s):

K. A. Bell ◽

M. Ebert ◽

S. D. Yoo ◽

K. Flock ◽

D. E. Aspnes

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Characterization ◽

Organometallic Chemical Vapor Deposition

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ChemInform Abstract: Growth of Polycrystalline CaF2 via Low-Temperature Organometallic Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.198941037 ◽

1989 ◽

Vol 20 (41) ◽

Author(s):

M. J. BENAC ◽

A. H. COWLEY ◽

R. A. JONES ◽

A. F. JUN. TASCH

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organometallic Chemical Vapor Deposition

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Preparation and Characterization of Cr-O Films Grown by Low-Temperature Chemical Vapor Deposition

Materials Science Forum ◽

10.4028/www.scientific.net/msf.386-388.353 ◽

2002 ◽

Vol 386-388 ◽

pp. 353-358 ◽

Cited By ~ 2

Author(s):

F. Barradas-Olmos ◽

Jorge Roberto Vargas-García ◽

J.J. Cruz-Rivera

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor

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